| Title: |
Oxford Instruments RIE System Plasmalab 80 Plus |
| Company: |
Capovani Brothers Inc. |
| Location: |
Scotia, NY, USA |
| Email: |
cbi@capovani.com |
|
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|
| Description: |
|  |
Manufacturer | Oxford Instruments |
Model | Plasmalab 80
Plus |
Wafer Size Range |
|
Maximum | 200 mm |
Process | Reactive Ion Etch |
Controller Type | PC
Controller Type |
Software Revision
Level | PC2000 Version 1.7A |
RF Generator Model | Dressler 300Watt, 13.56MHz |
Automatch Text | Oxford OPT AMU |
Number of Gas Inputs | Three Gas |
Process Gases | CF4, O2, Ar |
Chillers |
|
Number of
Chillers | 1 |
Chiller
#1Manufacturer/Model | Neslab RTE7 |
Other Information | Gas Pod: 6 gas inputs (3 inputs in use)
Vacuum Pump Package: Leybold WSU 251 and
Leybold D40BCS
|
Power Requirements | 208 V 26.0 A 50/60 Hz 3Â Phase |
Weight | 380 lb (172 kg) |
| |
|
| Close Date: |
March 30, 2015 |
| Phone: |
Capovani Brothers Inc. / +1 (518) 346-8347 |
| Email: |
cbi@capovani.com |