Plasmatherm Inductively Coupled Plasma Etcher 790 ICP

Title: Plasmatherm Inductively Coupled Plasma Etcher 790 ICP
Company: Capovani Brothers Inc.
Location: Scotia, NY, USA
Email: cbi@capovani.com
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Description:

CINCINNATI SUB-ZERO THERMAL 

SHOCK CHAMBER -75°C TO 371° C

Manufacturer

Plasmatherm

Model

790 ICP

Wafer Size Range

Minimum

50 mm

Maximum

200 mm

Controller Type

PC Controller Type

High Vacuum Pump

Leybold 361C

Roughing Pump

Leybold D40BCS

RF Generator Model

RFPP RF20M & RF5S

Automatch Text

RFPP AM -20 & AM-5

Number of Gas Inputs

Three Gas

Process Gases

TBD

Other Information

The top coil is supplied 2 MHz RF at 1000 watt max. RFPP Model RF20M
The bottom electrode is supplied 13.56 MHz RF at 500 Watts. RFPP Model RF5S
Refurbishment to Include:
Cleaning and recalibration of mass flow controllers.
Rebuilding of Leybold D40BCS prepped only with fomblin oil.
Rebuilding of Leybold 361C Turbo pump.
Cleaning of chamber and gas shower.

Power Requirements

208 V 60.0 A 60 Hz 3 Phase

Year of Manufacture

1998

Refurbished

YES

Close Date: March 30, 2015
Phone: Capovani Brothers Inc. / +1 (518) 346-8347
Email: cbi@capovani.com
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