| Title: |
Trion Technology ICP Oxide Etcher Oracle |
| Company: |
Capovani Brothers Inc. |
| Location: |
Scotia, NY, USA |
| Email: |
cbi@capovani.com |
|
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|
| Description: |
|  |
Manufacturer | Trion Technology |
Model | Oracle |
Wafer Size Range |
|
Minimum | 50 mm |
Maximum | 200 mm |
Set Size | 200 mm |
Number of Chambers | 1 |
Process Capabilities | Oxide Etch |
Chamber 1 Description | RIE Dielectric Etch
Phantom III RIE Reactor
|
Controller Type | PC
Controller Type |
Process Gases | CF4, CHF3, Ar, O2 |
Other Information | Central Vacuum
Transport (CVT) Platform
High Conductance Plenum and Vacuum
System
Manual Wafer Load Port
Automatic Pressure Control
600 Watt, 13.56 MHz RF
Generator
DC Bias Control
Brooks Automation VCE6 Vacuum Cassette Elevator
(2) Ebara ESR20N
2,000 LPM Dry Pumps,
|
Year of Manufacture | 2006 |
|
| Close Date: |
March 30, 2015 |
| Phone: |
Capovani Brothers Inc. / +1 (518) 346-8347 |
| Email: |
cbi@capovani.com |