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Plasma-Therm Reactive Ion Etch RIE System 790 11

Title: Plasma-Therm Reactive Ion Etch RIE System 790 11
Company: Capovani Brothers Inc.
Location: Scotia, NY, USA
Email: cbi@capovani.com
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Description:

Reactive Ion Etch System 11" Electrode

ManufacturerPlasmatherm
Model790 11" RIE
Wafer Size Range
  Minimum50 mm
  Maximum200 mm
ProcessReactive Ion Etch System
Close Date: August 16, 2015
Phone: Capovani Brothers Inc. +1 (518) 346-8347
Email: cbi@capovani.com
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