ULVAC Ferroelectric Etcher

Title: ULVAC Ferroelectric Etcher
Company: Capovani Brothers Inc.
Location: Scotia, NY, USA
Email: cbi@capovani.com
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Description:

Like New Condition
System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application

The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field).
The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications.
Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.

ULVAC FERROELECTRIC ETCHER

 

ManufacturerUlvac
ModelNE 7800 Ferroelectric Etcher
Wafer Size Range
  Minimum150 mm
  Maximum200 mm
  Set Size200 mm
Number of Chambers4
Process CapabilitiesTa, FeRAM, RRAM, MRAM
Chamber 1 DescriptionPreheat Chamber
IR heater
Range: 200 to 600 deg C

Chamber 2 DescriptionISM ICP Etch
ESD Chuck, 450C, He BS Cooling
Bias power: 2000W, 400 KHz
Antenna power: 3000W, 13.56 MHZ
UTM 1400FW/DIK Turbo Pump
Ebara ESR20N Dry Pump
Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3

Chamber 3 DescriptionISM ICP Etch
ESD Chuck, He BS Cooling
Bias power: 2000W, 400 KHz
Antenna power: 3000W, 13.56 MHZ
UTM 1400FW/DIK Turbo Pump
Ebara ESR20N Dry Pump
Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3

Chamber 4 DescriptionMicrowave Ashing Chamber
Heated Chuck, 280C
Bias power: 600W, 13.56 MHz
Microwave power: 3000W, 2.45 GHz
Endpoint detection
Ebara ESR200WN Dry Pump
Gases: 02, 02, H2/N2, CF4, N2

External CoolingWater Cooled
Other Information(3) Cassette load ports
(2) SMC Corp Model HRZ002 Chiller-Etch Chambers
(1) Ebara ESR20N dry pump, loadlock/xfer mod

Power Requirements208 V     220.0 A     60 Hz     3 Phase
Year of Manufacture2008
ConditionLike New
Close Date: April 12, 2016
Phone: Capovani Bros. +1 (518) 346 8347
Email: cbi@capovani.com
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