| Title: |
ULVAC Ferroelectric Etcher |
| Company: |
Capovani Brothers Inc. |
| Location: |
Scotia, NY, USA |
| Email: |
cbi@capovani.com |
|
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|
| Description: |
|
Like New Condition
System installed in October of 2007, decommission in Feburary of 2008. Used in a R&D application
 The Ulvac NE 7800 is a high-temperature, high-density plasma etching system utilizing an Inductive Super Magnetron source (ICP with magnetic field).
The NE 7800 is a dual load locked, cassette to cassette system designed for both R&D and production applications.
Outstanding metal etching process stability for Pt/Ir/magnetic films and difficult to etch materials such as FeRAM and MRAM devices.
| Manufacturer | Ulvac | | Model | NE 7800 Ferroelectric Etcher | | Wafer Size Range | | | | Minimum | 150 mm | | Maximum | 200 mm | | Set Size | 200 mm | | Number of Chambers | 4 | | Process Capabilities | Ta, FeRAM, RRAM, MRAM | | Chamber 1 Description | Preheat Chamber
IR heater
Range: 200 to 600 deg C
| | Chamber 2 Description | ISM ICP Etch
ESD Chuck, 450C, He BS Cooling
Bias power: 2000W, 400 KHz
Antenna power: 3000W, 13.56 MHZ
UTM 1400FW/DIK Turbo Pump
Ebara ESR20N Dry Pump
Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3
| | Chamber 3 Description | ISM ICP Etch
ESD Chuck, He BS Cooling
Bias power: 2000W, 400 KHz
Antenna power: 3000W, 13.56 MHZ
UTM 1400FW/DIK Turbo Pump
Ebara ESR20N Dry Pump
Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3
| | Chamber 4 Description | Microwave Ashing Chamber
Heated Chuck, 280C
Bias power: 600W, 13.56 MHz
Microwave power: 3000W, 2.45 GHz
Endpoint detection
Ebara ESR200WN Dry Pump
Gases: 02, 02, H2/N2, CF4, N2
| | External Cooling | Water Cooled | | Other Information | (3) Cassette load ports
(2) SMC Corp Model HRZ002 Chiller-Etch Chambers
(1) Ebara ESR20N dry pump, loadlock/xfer mod
| | Power Requirements | 208 V 220.0 A 60 Hz 3 Phase
| | Year of Manufacture | 2008 | | Condition | Like New |
|
| Close Date: |
April 12, 2016 |
| Phone: |
Capovani Bros. +1 (518) 346 8347 |
| Email: |
cbi@capovani.com |