3D Defect Characterization With the Expida 1285 DualBeam (FIB SEM) - Supplier Data By FEI Company
The Expida 1285 DualBeam (FIB / SEM) is a fast 3D defect characterization system that provides an accurate picture of your process, leading to increased control and improved yield.
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Atomic Force Microscopy ( AFM ) And Transmission Electron Microscopy (TEM)
Atomic Force Micrsocopy (AFM) and Transmission Electron Microscopy are two tools used in the characterisation of nanosized structures. The two techniques are explained and their modes of operation briefly described.
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Carbon Nanotube Manufacturing on a Commercial Scale - Ready for Mass-Markets
This article looks at the manufacturing process for carbon nanotubes and also considers their composition, classification and properties. Also discussed are commercial applications for nanotubes, market-place restrictions and the problems encountered when setting up the UK’s first production plant.
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Carbon Nanotubes - Measuring the Mechanical, Electrical and Field Emission Properties of Nanotubes
Transmission Electron Microscopy (TEM) methods can be used to measure the mechanical, electrical and field emission properties of individual carbon nanotubes. This overview highlights the in-situ TEM measuring techniques used to characterize the quantum and ballistic conductance of carbon nanotubes.
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Cryo-Fixation Prior To TEM Observation, Automation Using The Vitrobot from FEI Company
The unravelling of the Human Genome has stimulated research into the numerous mutual macromolecular interactions between genetic material, proteins, membranes and organelles. Cryo fixation and high-resolution imaging is a critical element of this research process.
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Electron Beam Lithography (EBL) - Overview of Systems, Processes and Potential Industry Applications
Electron Beam Lithography (EBL) is a special technique for making the very fine patterns that are needed by the electronics sector for integrated circuits. EBL resists (Negative Tone and Positive Tone), using polymethyl methacrylate (PMMA) in resists, and potential applications are considered here.
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Electron Microscope Breakthrough from IBM and Nion - New Technology
IBM and Nion have developed technology that extends the reach of electron microscopes. Using magnetic lenses and computers they have reduced the electron beam size to allow imaging of features not previously possible, by correcting aberrations. Posted August 8 2002
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Entry Level Scanning Electron Microscope, The Quanta HV from FEI Company
The Quanta HV SEM is a high-performance, entry-level scanning electron microscope with a tungsten electron source. It fulfills all needs for conventional imaging and microanalysis and its excellent performance at low tension gives true surface information from any sample.
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FEI Company Breaks the 1 Angstrom High Resolution Imaging Barrier - New Technology
FEI Company announced today that scientists at the company's nanotechnology centre have broken the one Angstrom image resolution barrier with a 200kV transmission electron microscope (TEM). Posted March 31 2004
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Field Emission Scanning Electron Microscope For Nanotechnology Applications; The Nova NanoSEM - Supp
Following the successful introduction of the Nova NanoLab DualBeam SEM/FIB nanotechnology workstation, FEI Company introduces the next Nova Tools for Nanotech family member: the Nova NanoSEM. This instrument is for ultra-high resolution characterization of charging and/or contaminating samples.
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