Breakthrough in Ultra Thin Photo Resists and Dielectrics for Semiconductors from Nanometrix
Nanometrix Inc. has announced a breakthrough in ultra thin "photo resist" and dielectrics for semiconductors. They have has been successful in producing films of photo resist on silicon wafers ˇÜ 25nm in thickness. Posted November 14 2005
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Creep Behaviour Investigation Using Micro or Nano Indentation Tester (MHT/NHT) From CSM Instruments
It has been shown that the indentation creep can be easily determined using the CSM Instruments Micro and Nano Indentation Tester (MHT and NHT). The indentation creep coefficient is defined as the relative change of the indentation depth whilst the applied force remains constant.
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Digital Pulsed Force Mode Provides New Prospective for Nanoscale Materials Research by WITec
The Digital Pulsed Force Mode (DPFM) provides new perspectives for materials research on the nanometer scale. Its ability to store the full tip-sample interaction during an AFM imaging process allows the user to record, along with the topography, mechanical and energetic properties.
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Electron Beam Lithography (EBL) - Overview of Systems, Processes and Potential Industry Applications
Electron Beam Lithography (EBL) is a special technique for making the very fine patterns that are needed by the electronics sector for integrated circuits. EBL resists (Negative Tone and Positive Tone), using polymethyl methacrylate (PMMA) in resists, and potential applications are considered here.
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Fine Tuning Strength and Conductivity of Nanotube Laced Materials - New Technology
Materials fortified with carbon nanotubes are strongest when the embedded filaments run parallel to each other, but electronic and thermal conductivity are best when the nanotubes are oriented randomly. Posted December 2 2003
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Modern Trends in Atomic Force Microscopy of Polymers - Supplier Data By Veeco
Initially introduced as an accessory to scanning tunneling microscopy (STM), atomic force microscopy (AFM) has become an advanced and most valuable scanning probe technique broadly used in academic and industrial research. A superior feature of AFM — the high-resolution visualization of surfaces — d
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Nanobyk Alumina Additives Improve Scratch and Wear Resistance of UV Coatings - New Product
Nanobyk additives from Nanophase Technology and BYK-Chemie are nano-sized alumina suspensions designed to be added to UV coatings. They were designed to improve the scratch and wear resistance of UV coatings. Posted June 28 2004
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Nanoparticle Additives Improve Polymer Performance - New Product
NanoProducts Corporation announced the commercial availability of nanoparticle additives with demonstrated performance for polymers. Posted June 30 2003
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Nondestructive Characterization of a Polymer Nanocoating using WITec Alpha300 AR - Application Note
Characterization of heterogeneous systems on the nanometer scale continues to grow in importance and to impact key applications in the field of materials science (phase segregated systems), nanotechnology (molecular electronics), and catalysis (single site catalysts).
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Scanning Near-Field Optical Microscopy (SNOM or NSOM) - Different Methods of Operation
Scanning Near-Field Optical Microscopes (SNOM or NSOM) offer far greater resolution than traditional optical microscopes. Conducting experiments using SNOM, feedback mechanisms, Photon Scanning Tunneling Microscopes (PSTM), Plasmon Near-Field Microscopes and nanolithography are all considered here.
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