NanoSEM brings unprecedented capabilities to researchers and developers in the nanotechnology laboratory working with non-conductive and contaminating nano-materials and/or –devices. It combines, for the first time in the history of Field Emission Scanning Electron Microscopy, magnetic immersion lens technology with Environmental SEM technology. Both these technologies have been FEI Company core technology competencies since the middle to late nineties. The combined effect yields unique ultra-high resolution, low-vacuum characterization possibilities in an environment that suppresses charge build-up on non-conductive materials or non-conductive components of nano-devices; in addition it suppresses electron-beam induced contamination resulting from previous sample processing steps.
System Options And Applications
System options include specific tools for Nanotech such as on-board software for pattern generation, a high-speed electrostatic beam blanker, as well as gas injection systems for direct electron beam writing of nanostructures. Impressive results have been obtained on common but challenging nanotechnology materials such as:
• Diamond films
• Carbon nanotubes
• GMR heads
• Semiconductor Cross Sections /with low k content
• Plastic Electronics
• Porous materials (e.g. silicon)
• Glass substrates
• Organic materials
The Nova NanoSEM is available with three different stage sizes: 6'' (150 mm), 4'' (100 mm) or 2'' (50 mm).