Topics Covered
Background
Applications and Markets
Semiconductor Polishing
Background
Nanophase Technologies is an industry-leading nanocrystalline
materials innovator and manufacturer with an integrated family of
nanomaterial technologies. The entire focus of Nanophase is nanotechnology, with two distinct and patented
processes for the preparation and commercial manufacturing of nanopowder
metal oxides i.e. Aluminum Oxide, Zinc Oxide, Cerium Oxide, Titanium
Dioxide, and several others. Nanophase Technologies Corporation has developed a process,
Discrete Particle Encapsulation, to coat the surface of its nanoparticles
with a thin polymeric shell that enables compatibility of the particles
with a wide variety of fluids, resins and polymers. Also, Nanophase has developed technology to permit the dispersion
of its nanoparticles in water and a variety of polar and non-polar
organic fluids. This allows Nanophase to supply concentrated, ready-to-use nanoparticle
dispersions, eliminating the need for customers to disperse the nanoparticles
themselves. Nanophase’s family of integrated technologies economically produces
nanocrystalline materials, and then nanoengineers those materials
to fit a customer need.
Applications
and Markets
Nanophase produces engineered nanomaterial products for a variety
of diverse markets: personal care, sunscreens, abrasion-resistant
applications, environmental catalysts, antimicrobial products, and
a variety of ultra-fine polishing applications, including semiconductor
wafers, hard disk drives, and optics. Various applications include
wood preservation, anti-fouling and anti-microbial coatings, fuel
cells, catalytic converters, UV-attenuation coatings, scratch resistant
coatings, charge dissipating coatings, deodorant/antiperspirants,
depilatory/shaving products, and others. In parallel, new markets
and applications are constantly being developed.
Semiconductor Polishing
As the semiconductor industry continues to move forward to smaller chip architecture,
the need for advanced CMP slurries becomes a requirement that cannot be met
by the slurries provided in the past for semiconductor polishing. Nanophase’s brand of ceria, mixed rare
earth metal oxides and alumina dispersions are on the forefront of providing
high planarity surfaces and efficient removal rates. These high purity dispersions
feature particles less than 100 nanometers in size with uniform morphology for
critical electronic polishing applications. The unique surface chemistry of
these nanomaterials allows formulation of highly concentrated dispersions at
a variety of pH.