Lithography and Nanoengineering - An Overview and Applications of Different Types of Lithography and Nanoengineering Instruments by Raith

Topics Covered

Introduction
RAITH150-TWO - Direct Write Electron Beam Nanolithography Tool
e_LiNE - Electron Beam Lithography and Nanoengineering Workstation
ionLiNE - Ion Beam Lithography, Nanofabrication and Engineering Workstation
RAITH50 - General Purpose Electron Beam Lithography Tool

Introduction

Raith manufactures a variety of electron beam lithography systems for research and development applications designed to meet the needs of researchers, designers, and engineers in both university and industry settings. Furthermore Raith develops ultrahigh precision stages and navigation packages for failure analysis applications.

Raith products range from stand alone e-beam writing tools to retrofit lithography attachments for SEM/FIB. Semiconductor industry needs are addressed by CAD navigation for failure and physical analysis of circuits.

RAITH150-TWO - Direct Write Electron Beam Nanolithography Tool

The RAITH150-TWO is the primary choice of Nano Research Centres for ultra high resolution patterning in the nanometer range and complex applications on masks and wafers up to 8 inch. A 20-MHz pattern generator using optimized pattern filling modes shortens exposure times. Stability is improved by newly designed shielding with independant temperature control.

Figure 1. RAITH150-TWO - Ultra high resolution electron beam lithography and metrology tool

The RAITH150-TWO utilizes the latest developments in electron optics technology. A unique cross-over-free beam path gives extremely high beam current densities of about 20,000 A/cm2 delivering ultra-high patterning resolution in combination with increased lithography throughput.

Key applications of RAITH150-TWO

  • Mix-and-match with optical lithography
  • Advanced device prototyping
  • Exposures on wafers and masks
  • Template manufacturing

e_LiNE - Electron Beam Lithography and Nanoengineering Workstation

e_LiNE is a ultra high resolution electron beam lithography system and nanoengineering workstation for universities and other academic institutions.

Figure 2. e_LiNE - Ultra high resolution electron beam lithography and nanoengineering workstation

Selected options for nanomanipulation, EBID and EBIE expand this system to a versatile nano-engineering workstation. The state-of-the-art e_LiNE electron column matches perfectly with a number of key applications in CNT research, thin film engineering, photonic crystals and EBID.

Key applications of e_LiNE

  • Lithography on 4 inch samples
  • EBID and EBIE
  • In-situ electrical measurements and nanomanipulation, e.g. CNT or nanorods

ionLiNE - Ion Beam Lithography, Nanofabrication and Engineering Workstation

ionLiNE is a novel ion beam lithography, nanofabrication and engineering workstation for low dose applications in surface science, thin film engineering and applied physics research. Designed in an uncompromised nanolithography system architecture, ionLiNE represents a new instrument class for research and development.

Figure 3. ionLiNE - Ion beam lithography, nanofabrication and engineering workstation

ionLiNE as dedicated ion beam nanolithography, fabrication, and engineering instrument offers unique opportunities for exciting research results. The patented NanoFIB TM ion optics provides overnight beam current stability required for advanced and automated patterning. Low beam tails offer high selectivity. For applications covering large areas, a laser interferometer controlled stage is integrated.

Key applications of ionLiNE

  • Low dose ion events
  • Thin film engineering
  • Surface functionalisation
  • Localised defect injection

For advanced nanoengineering, ionLiNE can be configured with nanomanipulators and a gas injection system.

RAITH50 - General Purpose Electron Beam Lithography Tool

RAITH50 is a general purpose electron beam lithography tool used for research and developments in the fields of MEMS and diffractive optical elements. It can handle samples up to 2 inch square

Figure 4. RAITH50 - Universal electron beam lithography tool

Key applications of RAITH50

  • Direct write on up to 2 inch samples with sub 100 nm resolution, ideal for MEMS applications
  • Optical elements like photonic crystals, beam splitters, gratings, DFB lasers or waveguides
  • Metrology, SEM inspection and sample navigation

Source: Raith

For more information on this source, visit Raith.

Date Added: Nov 12, 2008 | Updated: Jun 11, 2013
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