SEM and FIB Lithography Kits - ELPHY Nanolithography Systems for your SEM, FIB or SEM-FIB by Raith

Topics Covered

Introduction
SEM and FIB Lithography Kits
ELPHY Quantum - Most Widespread Lithography Attachment
ELPHY Plus - High End Advanced Lithography Package
Compact Laser Interferometer Controlled Stage

Introduction

Raith manufactures a variety of electron beam lithography systems for research and development applications designed to meet the needs of researchers, designers, and engineers in both university and industry settings. Furthermore Raith develops ultrahigh precision stages and navigation packages for failure analysis applications.

Raith products range from stand alone e-beam writing tools to retrofit lithography attachments for SEM/FIB. Semiconductor industry needs are addressed by CAD navigation for failure and physical analysis of circuits.

SEM and FIB Lithography Kits

In the late 1980's Raith offered the first commercial add on for SEM and FIB lithography. Meanwhile many hundreds of upgraded SEM and FIB with nano-patterning capabilities are workhorses for the R and D community.

With the expertise of 20 years Raith ELPHY systems are most versatile and offer best performance at affordable prices. Raith offers a worldwide, proven infrastructure to install, train and support ELPHY on your instrument.

ELPHY Quantum - Most Widespread Lithography Attachment

ELPHY Quantum is the most widespread and universal lithography attachment for SEM and FIB.

All required functions are fully integrated into one software, from pattern design, exposure parameter management, pattern overlay alignment to step and repeat exposures.

ELPHY Quantum hardware is a specifically designed 16 bit, 2.5 MHz DAC vector scan beam deflection PC board installed into a state of the art Windows computer. Raith's world wide support infrastructure for installation and training at your site warrants that you will able to pattern and inspect results within the shortest possible time.

Figure 1. ELPHY Quantum board with PCI interface installed in Windows PC

ELPHY Plus - High End Advanced Lithography Package

ELPHY Plus is a high end advanced lithography package for your SEM or FIB, and is typically chosen for use for Field Emission SEM or FIB with electrostatic deflection.

The high speed ELPHY Plus hardware architecture offers lowest noise, best signal quality and stability even at high writing speeds. No PC based approach can match the performance of the ELPHY Plus hardware.

Raith's world wide support infrastructure for installation and training at your site warrants that you will able to pattern and inspect results within the shortest possible time.

Figure 2. ELPHY Plus beam controller electronics

Compact Laser Interferometer Controlled Stage

To extend the capabilities of your ELPHY Quantum and ELPHY Plus SEM lithography tool the compact laser interferometer controlled stage (CLS) will replace your original SEM stage.

The positioning performance is greatly improved. Automated exposures involving stitching and precise mix and match will become possible. The Piezo-DC motor hybrid technology, is in a closed loop control with the interferometer. Therefore no calibrations are required for CLS positioning performance, as it is completely independent from any SEM or FIB settings.

The CLS is available for many SEM or FIB single column instruments. The CLS may also be adapted to new instruments. In any case, such implementation and investment requires a thorough evaluation and discussion, even in the early stages of your budgeting.

Figure 3. Compact laser interferometer controlled stage for SEM

Source: Raith

For more information on this source, visit Raith.

Date Added: Nov 12, 2008 | Updated: Jun 11, 2013
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