By AZoNano
Table of Contents
Introduction
Formulation of the Problem
Experimental Results and Discussion
Topoplogy of the PV Semiconductor Surface
Observations Under Photoexcitation
Conclusions
About NT-MDT
Introduction
The sun is an abundant, easily accessible power source which is
presently underutilized and will probably be the only choice for
electric power in the near future. It is believed that the best method
of solar power generation is using the photoelectric method used in
solar cells (SCs).It is envisioned by the EU that at least 3% of
the electric power will be provided from solar installations by the
year 2020.
Formulation of the Problem
Currently, the highest efficiencies are exhibited by MJ SCs based on
semiconductor nanoheterostructures. MJ SCs comprise a number of
sub-cells with p-n junctions and barrier layers of a number of
semiconductor materials. The arrangement of these subcells is in the
order of decreasing energy bandgap from the photosensitive surface to
the substrate connected by oppositely connected tunnel diodes. Hence
the whole solar spectrum energy is segmented and collected causing high
efficiencies. It is essential to understand that the most inefficient
subcell determines the total efficiency of an MJ SC. Determining the
constituent layers of this kind of composite device is possible with
indirect, integral measurement methods and mathematical simulations.
Information obtained thus is not always unambiguous as it requires the
solution of multivariate inverse problems.
An unambiguous determination will require separate monitoring of the
operation of all the constituent subcells.
Experimental Results and Discussion
An example is detailed below about how the NTEGRA
Spectra AFM confocal Raman fluorescence Probe NanoLaboratory (PNL)
is used in the study of MJ SCs based on a GaInP2/GaAs/Ge
heterostructure having three p-n junctions. The total number of layers
is more than 20 and individual layers are less than 20 nm thick as
shown in Figure 1.

Figure 1. Schematic of an MJ SC with three
subcells. Designations: various tints of pink, p-type layers of the
heterostructure; light blue tints, n-type layers; and yellow, highly
conducting layers of tunnel diodes and contact layers. The digits show
the p-n junctions in the subcells based on (1) Ge, (2) GaAs, and (3)
GaInP2.
The Kelvin probe force microscopy (KPFM) technique was used to
determine the surface potential profile variations of a
cross-section-cleaved SC with respect to the intensity, wavelength, and
beam position of a laser excitation source. Based on the schematic of
the layers in Figure 1, the distance between the p-n junctions of
neighboring subcells based on GaAs and GaInP2 is less than
a micrometer.
Response monitoring of the response, surface potential variation, of
a separate subcell was enabled by focusing the excitation laser into a
submicrometer spot. An objective having a numerical aperture of 0.7 and
resolving power of 400 nm was used in the confocal laser microscope
integrated in the NTEGRA Spectra PNL. An AFM cantilever is arranged
below the objective allowing simultaneous optical excitation and AFM
measurements as shown in Figure 2b. It is important to note that the
instrument enables independent and synchronized laser spot scanning and
sample scanning using a piezo driven mirror and sample piezo-scanner
respectively.

Figure 2. (a) Schematic of layers in an MJ SC
with the same color designations as those in Fig. 1. The three p-n
junctions are shown by arrows. (b) Schematic of experiment. Optical
micrographs of the edge of the cleaved surface of a SC during a
KPFM experiment under focused photoexcitation of (c) the p-n junction
in
Ge with a blue laser (473 nm) and (d) p-n junction in GaAs with a red
laser (785 nm). Latin numerals designate: (I) Ge substrate, (II) III-V
layers (GaAs and GaInP2 ), (III) free space,and (IV)
KPFM cantilever. The optical microscope is focused on the Ge substrate
in Fig. 2c,and on the III-V layers in Fig. 2d.
Topology of the PV Semiconductor Surface
Some of the results obtained in the first Case Study are listed
below:
- It is observed as shown in Figures 2c and 2d, near the cleaved
surface edges light spots from red and blue lasers focused on the p-n
junctions in the subcells of Ge and GeAs respectively.
- There is a sharp change in the surface topology in the left half
of the topographic image shown in Figure 3a. In this particular region,
the Ge substrate’s smooth relief changes to a striated topology of the
III-IV layers.
- Figures 2b and 2c show that III-V crystal materials are cleaved
easily to form atomically smooth and perfectly planar surface only
along 110 basal planes.
- Ge and Si crystals cleave along a different crystal planes.
- Ge substrate is two times thicker than all other MJ SC layers and
hence cleavage propagation directions are predominantly based on the
substrate
- The contact potential difference (CPD) map in Figure 3b shows
features in alignment with expected integrated potential differences in
the bulk heterostructure under total darkness conditions.
- The CPD map proves that near the p-n junction on the GaAs subcell
surface there is a decrease in the CPD signal instead of the peak as
shown in Figure 3c
- The light band region corresponds to well doped transition layers
between Ge and GaAs subcell
- These discrepancies are seen because the semiconductor structure
surface material varies from the bulk potential by near-surface band
bending not known for an arbitrarily cleaved sample.

Figure 3. KPFM study of the cleaved surface of
an MJ SC in the dark. During measurements both contacts to the MJ SC
were grounded. (a) Topographic image of the cleaved surface profile,
measured in semi-contactmode (the color-scale contrast spans the height
variations of 0.85 mm). (b) Map of the CPD
signal measured in the second pass in the absence of an external
photoexcitation (the color-scale contrast spans the CPD variations of
1.05 V). (c) Smoothed equilibrium profile of the built-in potential
(from model). Schematic of the layers: arrows with digits show the p-n
junction positions in the subcells (see also color designations in Fig.
1). Measurement parameters: AFM laser with a wavelength of 650 nm used
in the system for cantilever deflection detection, noncontact VIT_P
probe, resonance at 257 kHz, surface potential signal was measured at
100 nm lift height and Uac=2 V.
Observations Under Photoexcitation
When the semiconductor surface is exposed to
light with a photon energy more than the band gap of the
material, the photocarrier separation by the near-surface field results
in minority carriers emerging at the surface, which makes the band
bending smaller. This mechanism is applied for semiconductors with
surfaces depleted of majority carriers, in which the surface
photovoltage has the opposite sign of that of majority carriers. In a
complicated structure, photocarriers can be separated not only in the
near-surface field, but also in the bulk due to the field of built-in
barriers. For instance, it is possible to predict changes in the
surface potential on illumination of a single p-n junction. Due to the
photocarrier separation in the near-surface field, the p side is
charged negatively, and the n side positively. In contrast, the
separation of photocarriers in bulk material from the field of the p-n
junction charges the p side positively, and the n side negatively.
Some of the observations are listed below:
- If the number of photocarriers separated in the
field of the p-n junction exceed those separated in the near-surface
field, then the surface photovoltage will decrease, passing from the p
side to the n side.
- If the contacts to the p and n sides are shorted, then the
contribution from the bulk separation is eliminated, and the surface
photovoltage will increase on such a transition.
- Figure 4 shows two sets of simulated and measured photovoltage
profiles from a cleaved surface in alternate photoexcitation of p-n
junctions in three subcells of MJ SCs.
- The first set of profiles, Figs. 4a-4c, was obtained with blue
laser excitation (wavelength l= 473 nm),
and the second, Figs. 4d-4f, with red laser excitation (l = 785 nm). The photoexcitation densities were
approximately the same in both cases, 2-3 mW/ m . The focal spot
diameter D was calculated using the Rayleigh criterion D = 1.22 /NA,
where l is the laser wavelength, and NA =
0.7 is the numerical aperture of the objective.
- Determination of the surface photovoltage profile was by the
difference of PD values determined under photoexcitation and in the
dark.
The simulation process was done with the following conditions:
- The contacts to the MJ SC are shorted
- The photovoltage appearing in the bulk of a p-n junction exposed
to light is distributed among the barriers of two nonilluminated p-n
junctions.
- Also, the capacitances of these two junctions are considered to
be equivalent.
- The light from the blue laser is absorbed by all layers in the MJ
SC and light from the red laser is not absorbed by the wide band gap
GaInP2 layers.
- In the experimental photovoltage profiles, the arrows show a dip
in Fig. 4b and a peak in Fig. 4c. The simulation predicts these
specific features.
- The GaAs subcell is insulated from the contacts to the MJ SC by
the potential barriers at the p-n junctions of the neighboring
subcells. In case it is exposed to blue light, separation of
photocarriers in the field of the p-n junction causes electrons to get
ejected into the n layers of this subcell. Hence, a negative potential
appears in the bulk of these n layers and in the p layers of the GaInP2
subcell. Due to the photocarrier separation in the near-surface field,
the surface of the p layers is also negatively charged in relation to
the bulk.
- The joint effect of both processes forms a deep dip in the
surface photovoltage profile when it passes across the p layers of the
GaInP2 subcell, as seen in Fig. 4b. If red light is used, no
photocarriers are generated in the wide-bandgap GaInP2
layers. Consequently, the dip should be less pronounced, which is
indeed observed in Figure. 4e. When the GaInP2 subcell is
exposed to blue light, a positive potential appears in the bulk of its
p layers and is transferred to the n layers of the GaAs subcell.
- The photoeffect at the surface of the n layers is also positive,
and a peak corresponding to these layers appears in the photovoltage
profile

Figure 4. Comparison of experimental and
simulated data. (a-c) Photoexcitation with laser light (l = 473 nm) focused on the p-n junctions in (a)
Ge, (b) GaAs, and (c) GaInP2 . (d-f) Photoexcitation with
laser light (l = 785 nm) focused on the p-n
junctions in (d) Ge, (e) GaAs, and (f ) GaInP2 .
Designations: SPV, experimental surface photovoltage profile. A
simulated profile is also given above each plot. Below, under all the
plots are shown schematics of layers in MJ SCs (with the same color
designations as those in Figs. 1-3).omparison of the experimental and
simulated data. (a-c) Photoexcitation with laser light (l = 473 nm) focused.
Conclusions
The conclusions from the study are listed below:
- The study of a solar cell with three subcells based on Ge, GaAs,
and GaInP2 in a NTEGRA
Spectra PNL showed that it is possible to monitor the
operation of each subcell separately.
- The experimental surface photovoltage profiles obtained comply
with the results of the qualitative simulation.
- This agreement between the experimental data and the simulation
results show that there are no parasitic barriers in the multijunction
solar cell under study for the chosen photoexitation densities.
- It should be noted that the NTEGRA
Spectra PNL, integrating AFM with optical spectroscopy techniques
offers a significantly broader set of capabilities for solar cell
diagnostics than that considered in the present communication.
- The following measurement techniques with submicrometer and
nanometer spatial resolution that include the following are possible:
- surface topography
- local conductivity
- variations of potentials and charges
- built-in or induced by external bias or photoexcitation
- evaluation of compositional homogeneity and material defects
- spatial and spectral variations of transmittance,
reflectance, and other optical properties
- localization of nonradiative recombination regions
- monitoring of p-n junction positions
- monitoring of heterointerface transitions
- mapping of mechanical stresses
All of these measurement scan be used to optimize the solar cell
technology. For example, the internal design of solar cells can be
optimized through correlation of regions having the maximum
photovoltaic conversion efficiency with data on variation of the
chemical composition, layer thickness, profile, defects and optical
parameters.
About NT-MDT
NT-MDT
has 550 employees, including Ph.D. scientists, many of whom are leaders
in their field. The company has more than 600 installations in 39
countries, and has been operating in the APM market for more than 15
years, achieving worldwide distribution of their devices. NT-MDT's
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This information has been sourced, reviewed and
adapted from materials provided by NT-MDT Co.
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