Advancements in nanotechnology have resulted in a variety of new materials with exotic and valuable properties. Since nanomaterials are increasingly being used in consumer products, it is essential to gain insight into the correlation between the physical and chemical properties of nanomaterials and their impending risk to the human health and environment.
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VG Scienta offers a suite of Fast Entry Load lock (FEL) modules for easy and rapid transfer of substrates from the vacuum system. During the process, the main vacuum chamber is not exposed to atmospheric contamination.
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The central distribution concept from VG Scienta provides more options in new material development, where the process could include steps such as in-situ analysis and multiple deposition stages for the qualification of material development without atmospheric exposure of the sample.
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The metallization module from VG Scienta is a versatile system for the thermal evaporation of metals across a broad range of temperatures.
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The organics deposition module from VG Scienta can be operated either as a component of the VG Scienta OFT EDGE cluster tool, or as a stand-alone unit with fast entry load lock.
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VG Scienta offers electron spectrometers and photon sources that are well recognized for delivering researchers with sophisticated ARPES data.
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The planar magnetron is a typical diode mode sputtering cathode consisting of a permanent magnet array behind it. This magnet array is organized in such a fashion to provide a magnetic field that is normal to the electric field
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Thermal evaporation is one of the most widely used techniques of physical vapor deposition (PVD). It is a type of thin film deposition, which is a vacuum process wherein coatings of pure materials are applied over the surface of many different objects.
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Strem Chemicals, a provider of high-purity specialty chemicals, offers an extensive range of bubblers and cylinders for the CVD/ALD processes.
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Process conditions have a considerable impact on material properties that are produced with the help of ALD/CVD, the right selection of precursors is very important in order to obtain the desired material. Initially CVD precursors include metal hydrides and halides but today a large array of metal organic compounds are used that include metal alkoxides, metal alkyls, metal diketonites, metal amidi
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