:: AZoNanotechnology Article
Lateral Force Microscopy of Dip-Pen Nanolithography Produced Dots Using EasyScan
2 FlexAFM from Nanosurf
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Topics Covered
Background
Introduction
Instruments used
Lateral Force Microscopy
Background
Nanosurf is a leading provider of easy-to-use atomic force
microscopes (AFM) and scanning tunneling microscopes (STM). Our products and
services are trusted by professionals worldwide to help them measure, analyze,
and present 3D surface information. Our microscopes excel through their compact
and elegant design, their easy handling, and their absolute reliability.
Introduction
Several different lithography techniques exist that allow modification of material
surfaces during or after their microfabrication. One of the most versatile of
these techniques probably is the so-called Dip-Pen Nanolithography® (DPN).
DPN® is the nanoscale equivalent to writing with a fountain pen, in which
the tip of an atomic force microscope (AFM) cantilever acts as the pen (Figure
1). The "ink", which can consist of a wide variety of nanoscale materials, is
transferred from the tip to the sample surface through a water meniscus that
automatically forms between tip and surface at ambient humidity.
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Figure 1. Principle of Dip-Pen Nanolithography®
(DPN).
(Left) Loading: A cantilever is dipped into a nano-well
of "ink" and is retracted. (Right) Writing: The loaded
cantilever is brought into contact with the writing surface,
and "ink" is being deposited through a self-forming water
meniscus. Images courtesy of Nanoink Inc.
The strength of DPN® lies in its high patterning resolution (15 nm) and
accuracy (5 nm). This way, it is possible to deposit new substances (e.g. Thiols
or other chemicals) onto a surface in a highly controlled manner and on a tiny
scale, resulting in exciting new applications. The technique of Dip-Pen Nanolithography®
was reported by Professor Chad Mirkin at Northwestern in 1999, who was awarded
the patents for the process. The exclusive license for the DPN® technology
resides with NanoInk, Inc., which is the sole provider for DPN® equipment.
The characteristics of materials deposited by DPN® are usually studied by
Lateral Force Microscopy (LFM), as it is one of the few techniques capable of
detecting material differences at such high resolutions. The Nanosurf
easyScan 2 FlexAFM offers LFM in combination with easy handling, making
it an obvious choice for DPN® analysis.
Instruments used
All measurements were performed with a Nanosurf
easyScan 2 FlexAFM Large Scan (100 µm scan range) scan head equipped
with a CONTR type cantilever and operated in Lateral Force mode in air.
Lateral Force Microscopy
Lateral Force Microscopy allows areas with different
frictional attributes to be distinguished. Differences
in frictional attributes can arise through differences in
viscosity, elasticity, adhesion, capillary forces, surface
chemistry, or electrostatic interactions of the materials
involved. When a cantilever is scanned statically and
perpendicularly to its longitudinal axis, a torsional bending of the cantilever
occurs. The angle of torsion
is proportional to the lateral force acting on the tip.
When moving over a flat surface with regions showing
different frictional attributes, the angle of torsion
will be different for each region. These regions with
different friction attributes can therefore be mapped,
and their properties analyzed (Figure 2).
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Figure 2. AFM recordings on Alkanethiol molecules
deposited on gold using Dip-Pen Nanolithography® (DPN),
NanoInk's patented process for deposition of nanoscale
materials onto a substrate. (Left) Topography data. (Right)
Lateral force data. The combined scan area of the two image
halves corresponds to 1.0 µm x 1.0 µm.
As the cantilever load normal to the surface has a
lateral component at inclined surface features, surface
topography has an influence on the lateral force
measurement. Fortunately, it is possible to distinguish
between lateral deflection due to topographic features
of the surface and due to frictional forces by simply
comparing the forward and backward scan of the AFM images. The lateral deflection
due to frictional forces
changes sign while the one produced by topography
does not (compare Figure 3, left and right).
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Figure 3. Differences between lateral forces
caused by
friction and the ones caused by topographic features of
the scanned surface. (Left) Mirroring of lateral deflection due
to frictional forces. (Right) No mirroring with topographically
induced lateral deflection. All forward scan traces are in blue,
backward scan traces in red.
Depending on the elasticity of the sample, the sample
surface can be deformed during measurements in
lateral force mode, especially when it has steep inclines
or high topographic features. This deformation may
lead to artifacts in the measurement or even to damage
of the sample due to the excessive lateral forces that
arise from these features. To avoid these deleterious
effects, make sure the effective stiffness of the surface
is higher than the cantilever's torsional stiffness.
LFM has been successfully used to investigate surface
contaminations, chemical specifications, and frictional
characteristics of materials such as semiconductors,
polymers, thin films, and data storage devices.
Source: Nanosurf
For more information on this source please visit Nanosurf
Date Added: Oct 19, 2009
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