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Thin Film Deposition Software – Control Deposition Processes – AERES

Thin Film Deposition Software – Control Deposition Processes – AERES

AERES from Angstrom Engineering is programmed to intelligently unify the control of every aspects of thin film processes, from materials management to the production of highly complex, multi-layer thin film architectures.

When AERES is paired with one of Angstrom Engineering’s PVD platforms or Cluster systems, users acquire a powerfully simple tool that will save a lot of time, resources, and effort. It can handle the most advanced user and complex recipes, and at the same time is simple enough for all users in the lab.

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Recipe Control

AERES unifies the whole process into one executable recipe, including:

  • Pre-deposition - wafer preparation, source ramp-up, and stabilization
  • Automation - press start and leave the system to do everything
  • Layer control - thickness, rate, shuttering, and source idling
  • Gas and pressure - pressure stability and precise gas delivery
  • Stage control - heating, cooling, rotation, angle and biasing

Users can create as simple or complex processes as desired, use loaded templates, or build custom sequences from scratch, and can even prepare recipes from a remote computer, and then seamlessly transfer it over to the deposition PC terminal for use.

AERES can be fully operated autonomously, or users can build manual control into recipes if required. The unified data management system gathers and logs all significant process data.

Layer Transition Efficiency

As AERES controls all aspects of the process, it has the ability to significantly improve efficiency by reducing redundancies and to control several parameters at the same time.

Parallel task management allows sources to warm up before being used, so layers can be deposited in rapid succession. This parallel task management includes source preparation, power and temperature ramping, mask and sample transfer, and stage preparation.

As can be seen in the following table, Angstrom Engineering’s partners have reported a 45 % reduction in transition times, and a 30 % improvement in total device fabrication.

Advanced Deposition Control

Angstrom Engineering’s partners have accomplished unparalleled low-rate stability. AERES includes advanced auto-tuning with a user modifiable PID detection algorithm. In the following case, stability of 0.02 Å /second was accomplished depositing a common OLED material (Alq3).

AERES is available across all Angstrom Engineering platforms.

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