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Posted in | Sputtering Systems

AJA International ATC Series Sputtering Systems

The AJA International, Inc. ATC Series Thin Film Deposition Systems are versatile coating tools that can be built in a wide variety of configurations to satisfy almost any requirement. These systems are built around AJA's unique A300-XP (UHV) or Stiletto Series (HV) magnetron sputtering sources which feature in-situ source head tilting allowing precise and repeatable con-focal, direct, and off-axis deposition. Larger systems are fitted with a heavy duty hydraulic hoist to lift the chamber top for system access - the chamber top swings to either side at the top of the hoist's stroke. Medium and small ATC systems feature a hinged top with gas shock assist mechanism for easy chamber access.

Substrate holders from 1" to 10" diameter are available with heating to 1000°C and/or substrate cooling from ambient to LN 2 temperatures. AJA magnetron sputter sources from 1" diameter to 12" diameter plus rectangular and triangular versions can be incorporated.

These multi-technique deposition systems systems can be also fitted with electron beam evaporation, thermal evaporation, Knudsen cells, PLD, ion sources for IBAD, facing target sputtering sources (FTS), contact masking systems, glove boxes, auto-loading cassette systems, RHEED, Auger analysis, and RGA's.

Typical Sputtering System Configurations

  • ATC 1300 (13" diameter)
  • ATC 1500 (15" diameter)
  • ATC 1800 (18" diameter)
  • ATC 2000 (20" diameter)
  • ATC 2200 (22" diameter)
  • ATC 2400 (24" diameter)
  • ATC 2800 (28" diameter)

The maximum number of sputter sources will depend on the substrate size, configuration and magnetron sputter source size. For example, the ATC 1800 can be fitted with (5) 2" magnetrons with in-situ tilt. AJA offers 1", 1.5", 2", 3", 4" diameter rectangular and triangular sources on the ATC series. Consult the factory for optimum configuration.

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