The DWL 2000 laser lithography system is a fast and flexible,
high resolution pattern generator for mask making and direct
writing. With a write area of up to 200 x 200 mm2 the system is
the perfect solution for fast patterning of masks and wafers in
MEMS, BioMEMS, Micro Optics, ASICs, Micro Fluidics, Sensors,
CGHs, and all other applications that require microstructures.
In addition to high resolution 2D patterns, the state of the art
technology of the system can also create complex 3D structures
in thick photoresist with a single pass. This feature enables quick
and easy fabrication of custom made micro-optics with refractive
or diffractive elements. The design process for these structures
is supported by conversion software specifically designed for
these 3D applications. The air-bearing based and linear motor
driven stage system further improves the quality of the 3D
structures by eliminating any mechanically induced vibrations.
The DWL 2000 can utilize different lasers, making it possible to expose nearly
all photoresists. A fixed optical setup, a reliable auto focus system and a
high precision stage system guarantee the quality and position accuracy of the
exposed structures. A high resolution interferometer monitors the position of
the stage at all times. To ensure the stability of the system, it is placed
in a climate chamber, providing a constant temperature. Additional software
is used to compensate for any remaining variation in the mechanical structures
or the environmental parameters.