Posted in | Atomic Layer Deposition (ALD) Systems

庫爾特 J. Lesker公司ALD的200L系列

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庫爾特 J. Lesker公司提供獨立的ALD系統完全集成的基礎研究或沉積系統複雜的研發應用。我們所有的ALD系統平台功能高速ALD的閥門和綜合泵站，壓力測量，天然氣輸送包為您的具體過程進行了優化。

主要特點：

粘性流動 ALD的反應堆室
Cabnit設計允許反應物投入大量
前端端口基板裝載不銹鋼加熱室
可容納 8“直徑基板
基板加熱到500 ° C
線加熱到200 ° C
完全用盡氣櫃聯鎖
配方驅動的過程控制軟件
選項包括：遠程等離子體負載鎖;氣閉環控制起泡

Last Update: 24. October 2011 20:33

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