The Cambridge NanoTech Fiji F200 series is our most advanced ALD research and
development system. The Fiji is a modular high-vacuum ALD system that accommodates
a wide range of deposition modes using a flexible system architecture and multiple
configurations of precursors and plasma gases. The result is a new generation
ALD platform capable of doing thermal as well as plasma-enhanced deposition.
Cambridge NanoTech has combined its leading ALD expertise with advanced Computational
Fluid Dynamics analyses to optimize Fiji F200 ALD reactor, heater and trap geometry.
The hyperboloid reactor geometry combined with the paraboloid substrate heater
creates a laminar precursor and remote plasma generated radical flow. This type
of design that you can only get from knowledgeable ALD experts, optimizes deposition
uniformity and minimizes cycle time and precursor use.
The Fiji 200 comes in several different configurations including Dual Chamber
and Load Lock. Each chamber can be configured with up to six heater precursor
lines and 5 plasma gas lines, offering the greatest experimental flexibility
in a compact footprint. Please let us know what your ALD needs are and we can
configure a Fiji system that is right for you.