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NanoLith 7000 from Cymer Inc.

A fourth-generation design, the NanoLithTM 7000 provides the required output power and stability while providing a highly line-narrowed bandwidth to meet the stringent requirements of high volume production today. The NanoLith 7000 offers a bandwidth of < 0.5 pm FWHM and < 1.3 pm 95 percent energy integral, which enables next-generation scanners with high Numerical Aperture lenses to produce the resolution for sub 100 nm devices.

Today’s chipmakers seek light sources that make the critical transition in exposure wavelength from 248 nm using krypton fluoride (KrF) to 193 nm using argon fluoride (ArF) while maintaining the performance and volume demands of mainstream manufacturing. The NanoLith 7000 was designed to meet these demands.

Consider these benefits of the NanoLith 7000:

  • The Wavelength Stabilization Module (WSM) delivers high accuracy tuning wavelength control to ensure optimal focus control, maximum exposure latitude, and improved CD control.
  • Highly sophisticated metrology tools optimize spectral distribution to deliver maximum process margin.
  • Design efficiency improvements boost module lifetimes by a factor of five or more resulting in an expected 80 percent cost of consumables (CoC) reduction over 5000 Series ArF systems.
  • Reliability you can count on and compliance with all safety regulations make the NanoLith 7000 the choice for chipmakers worldwide.
  • Reliability you can count on and compliance with all safety regulations make the NanoLith 7000 the choice for chipmakers worldwide.
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