Eulitha's
nanoimprint templates are manufactured with electron beam or its unique
EUV lithography technology. Standard templates include 35 nm half-pitch linear
gratings and 53 nm half-pitch dot arrays, both of which are made with exceptional
quality thanks to the EUV exposure capability. Custom
made templates are made according to customer specifications with the most
suitable technology choice: EUV technology enables production of high-resolution
periodic structures (sub-100nm) over large areas whereas e-beam is used for
making arbitrary patterns.
Applications of Eulitha's
templates include process development and verification, nano-optics, SERS
substrates, patterned magnetic media, microscope calibration, nano-electronics
and templated self-assembly. Contact us with your needs for expert advice from
our world-renowned scientific staff.
Key features:
- Resolution down to 20 nm
- Anti-adhesion coating (optional)
- Quick turn around time of 4-6 weeks
- Area/resolution combinations (e.g. 35 nm over 1cm2)