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Park Systems XE-100 Atomic Force Microscope with Step-and-Scan Automation

The XE-100 is our flagship AFM with reduced drift rate and the Step-and-Scan Automation that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical coupling with its open side access.

Artifact Free Imaging by Crosstalk Elimination

  • Two independent, closed- loop XY and Z flexure scanners for sample and tip
  • Out of plane motion of less than 2 nm over entire scan range
  • Flat and linear XY scan of up to 100 µm x 100 µm with low residual bow
  • Up to 25 µm Z-scan by high force scanner
  • Accurate height measurements
  • Reduced drift rate of less than 0.5 nm/min

Ultimate AFM Resolution by True Non-Contact Mode

  • 10 times larger Z-scan bandwidth than a piezotube
  • Less tip wear for prolonged high-quality and high-resolution imaging
  • Minimized sample damage or modification
  • Immunity from parameter-dependent results observed in tapping imaging

User Convenience by EZ Design

  • Wide open access to the tip and sample
  • Snap tip exchange & EZ Laser beam alignment
  • Dovetail-lock mount for easy head removal
  • Direct on-axis optics for high resolution optical viewing
  • Motorized optics stage

Full Option Compatibility with Modular Platform

  • Full SPM modes and options
  • Open side access for optical coupling
  • Motorized sample stage with Step-and-Scan automated measurements
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