The XE-100
is our flagship AFM with reduced drift rate and the Step-and-Scan Automation
that provides the ultimate AFM/SPM performance in Non-Contact nanoscale metrology.
It is a mid-priced system for materials science, polymers, electrochemistry
and other applications in nanoscience and engineering. It can adopt a wide range
of optical coupling with its open side access.
Artifact Free Imaging by Crosstalk Elimination
- Two independent, closed- loop XY and Z flexure scanners for sample
and tip
- Out of plane motion of less than 2 nm over entire scan range
- Flat and linear XY scan of up to 100 µm x 100 µm with
low residual bow
- Up to 25 µm Z-scan by high force scanner
- Accurate height measurements
- Reduced drift rate of less than 0.5 nm/min
Ultimate AFM Resolution by True Non-Contact Mode
- 10 times larger Z-scan bandwidth than a piezotube
- Less tip wear for prolonged high-quality and high-resolution imaging
- Minimized sample damage or modification
- Immunity from parameter-dependent results observed in tapping imaging
User Convenience by EZ Design
- Wide open access to the tip and sample
- Snap tip exchange & EZ Laser beam alignment
- Dovetail-lock mount for easy head removal
- Direct on-axis optics for high resolution optical viewing
- Motorized optics stage
Full Option Compatibility with Modular Platform
- Full SPM modes and options
- Open side access for optical coupling
- Motorized sample stage with Step-and-Scan automated measurements