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TFS 1200薄膜沉積系統從 Beneq

Beneq TFS的1200是一個ALD處理模塊集成的CIGS蒸發或快速熱處理(RTP)的硒化線。 30納米厚的鋅(O,S)緩衝層沉積時間不到5分鐘。 ALD是更緊湊,更便宜,比傳統的CBD - CDS緩衝層的進程。

Beneq TFS 1200是銅銦鎵硒(CIGS)薄膜太陽能電池工業的緩衝層塗料的生產線而設計的特定應用的系統。最大基板尺寸為 1200 × 1200(毫米),公認的世界紀錄在ALD在基板大小。

Last Update: 4. October 2011 21:48

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