A leader in supplying well designed and process compatible substrate heaters to our thin film R&D and manufacturing customers working in the areas of electronics, optoelectronics, photonic, microelectronics, environmental science, thin film production and packaging, biotechnology, semiconductors, applied and solid state physics, chemistry, and thin film device engineering and technologies.
Blue Wave's substrate heaters are specially designed for thin film deposition technologies such as physical vapor deposition and chemical vapor deposition. Substrate heaters are composed of specialty high temperature oxidation and chemical resistant metal alloys with integrated high temperature chemical resistant ceramics compatible to vacuum, oxygen and reactive gases while operating up to 900°C, and in inert or vacuum up to 1000°C. Blue Wave's heaters have exceptional temperature uniformity across heater surface area to provide uniform temperature for substrates for uniform thin film, coating, and high yield in device fabrication.
Blue Wave provides two technologies, one dedicated for oxide based or reactive processes, and other based on vacuum processes
Typical features include: Temperature variation throughout the heater is within 2-5% for up to 2" heater and 5-10% for up to 12"diameter wafers at 800°C. Temperature of a wafer or substrate can be controlled within 1°C.
Heaters are available in
1) 1.6 inch OD hot zone with 2.0 inch collar,
2) 2.2 inch OD heater with 3 inch collar
3) 3.1 inch OD heater with 3.5 inch collar
4) 4.1 inch OD heater with 4.5 inch collar
All collars are tapped with threaded holes for sample mounting