The QUAD-EV series mini e-beam evaporators available from MANTIS have been designed to allow controlled evaporation of materials under ultra-high vacuum (UHV) conditions.
The sources are developed in such a way that they can function under UHV conditions with minimum contamination. They are meant for applications where films of different thicknesses ranging from one layer to 100 nm have to be deposited.
First, a rod or crucible is biased at +2000 V and then placed close to a filament. After adequate amount of current is passed via the filament, it attains electron emission temperature. Following this, a stream of electrons is pulled from the filament towards the target crucible or rod. This stream of electrons collides on the surface with high energy and produces heat, thus leading to evaporation.
The QUAD source is developed for four-pocket co-evaporation of different materials. It is supplied with automatic or manual shutter.
All models have integrated flux monitoring plates. These provide real-time feedback of the deposition rate and also can be used in a closed loop control for rate stability and control. The flux monitoring plates are located at the top of the source and below the shutter and can provide an accurate reading of the evaporation rate even with the shutter closed.
The QUAD source can be supplied with either manual or automatic shutter. The shutter can be used to control which pockets are evaporating material. The shutter can be in one of 6 positions, each of which has a combination of pockets open. This allows the pocket to start evaporation at a fixed rate rather than ramping up the power. This means that the total thickness deposited can be controlled more accurately.
The power supply is designed to operate in three control modes:
- Filament Current Control: The user regulates the filament current directly.
- HV Power Control: The user sets the HV Power and the supply adjusts the filament current to achieve the desired power.
- Flux control: The user sets the desired evaporation flux and the supply adjusts the filament current to achieve the desired flux.
The main features of the QUAD-EV series mini e-beam evaporator are:
- QUAD source developed for four-pocket co-evaporation of a variety of materials
- Source designed to operate under UHV conditions
- Can be integrated with crucibles or rods interchangeably
- Integrated flux monitoring plates
- Special carbon sleeve for platinum evaporation
- QUAD source provided with manual or automatic shutter
- Multifunctional power supply
- Four electrically independent pockets
- Dedicated software with easy and intuitive control
The applications of the QUAD-EV series mini e-beam evaporator are:
- Ultra-thin films
- Surface science
- Nanostructured films
- Alloy materials
- Contact metallization
MANTIS QUAD Series Mini e-beam Evaporators
QUAD series mini e-beam evaporators
QUAD series mini e-beam evaporator principle of operation
Key Features of the QUAD series mini e-beam evaporator
QUAD series mini e-beam evaporator deposition rate versus power
QUAD series mini e-beam evaporator technical features