Single Wafer Etch Technology - PlasmaPro 100 Sapphire Single Wafer Etch System from Oxford Instruments

Oxford Instruments’ PlasmaPro 100 Sapphire is an evolution in single wafer etch technology. The technologies from the company enable the cost of ownership and help maximise the performance of devices, thanks to wide experience of etching all HBLED-related materials.

The PlasmaPro 100 Sapphire single wafer etch system delivers smart solutions to produce the etch results needed to maintain customer’s competitive edge in the market. The system uniformly delivers fast etch rates across large wafer batches since it has been designed particularly for the harsh chemistries needed for HBLED materials.

Key Features:

The main features of the PlasmaPro 100 Sapphire single wafer etch system are:

  • Actively cooled electrode to retain sample temperature during etch process
  • High conductance pumping system
  • Fast etch rates on wafers up to 200 mm diameter
  • Magnetic spacer for better ion control and uniformity
  • High power ICP source generating high density plasmas
  • Exclusive electrostatic clamp technology with an ability to clamp Sapphire, Si and GaN on Sapphire
  • Reliable hardware and simple serviceability for superior uptime
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