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Thermal, Magnetron and Ion-Beam Deposition System – Caroline D12A from ESTO-Vacuum

Caroline D12A, an automated deposition system from ESTO, is specifically designed for magnetron, thermal, and ion-beam deposition on any flat substrates such as ceramic, silicon, or glass-ceramic substrates with a diameter of less than 100mm and thickness of less than 30mm.

The D12A system can be configured for a variety of applications by placing different types of equipment to five D12A installation points. It includes ion sources for initial surface cleaning and etching, magnetrons, ion-beam sputter, and thermal evaporator.

Key Features

The main features of the Caroline D12A system are:

  • Preliminary cleaning of DC ion source surface for improved adhesion of the sputtered films
  • Full sputtering automation from loading to unloading of substrates
  • Gas consumption control and gas flow rate stabilization in each channel
  • Control of metal and resistive films deposition process based on the resistance of the piece of substrate, deposition time and film thickness
  • Preheating of substrates and sustaining the substrates temperature throughout film deposition
  • Easy-to-install substrates holders for fast loading and unloading operations
  • Unique chamber cover lifting mechanism allows for easy replacement of modules

Applications

The applications of the Caroline D12A system are:

  • Resistive films deposition
  • Thick metal film deposition
  • Consequent PC and metal layers deposition
  • Tantalum nitride films deposition
  • Silicon nitride and silicon dioxide films deposition utilizing pure silicon target
  • Tantalum and titanium films deposition and layers of corresponding oxides and nitrides
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