Flexible, Configurable Film and Coating System for Thermal, Magnetron and Ion-Beam Deposition – Caroline D12A1 from ESTO-Vacuum

Caroline D12A1 system, available from ESTO, has been developed for magnetron, thermal and ion-beam deposition on flat substrates such as ceramic, silicon or glass-ceramic substrates with a diameter of less than 100mm and thickness of less than 30mm.

The Caroline D12A1 system can be configured for a wide range of applications by placing different types of equipment to five D12A1 installation points. The system comprises ion sources for initial surface cleaning and etching, magnetrons, ion-beam sputter and thermal evaporator.

Key Features

The main features of the Caroline D12A1 system are:

  • Preliminary cleaning of DC ion source surface for enhanced adhesion of the sputtered films
  • Preheating of substrates and sustaining the substrates temperature throughout film deposition
  • Gas consumption control and gas flow rate stabilization in each channel
  • Control of metal and resistive films deposition process based on the resistance of the piece of the substrate, deposition time and film thickness
  • Full sputtering automation from loading to unloading of substrates
  • Easy-to-install substrates holders for fast loading and unloading operations
  • Rectangular chamber door allows for easy holders changing
  • Special hydraulic lift mechanism for easy maintenance of chamber equipment


The applications of the Caroline D12A1 system are:

  • Tantalum nitride films deposition
  • Resistive films deposition
  • Thick metal film deposition
  • Consequent PC and metal layers deposition
  • Tantalum and titanium films deposition and layers of corresponding oxides and nitrides
  • Silicon nitride and silicon dioxide films deposition using pure silicon target
Ask A Question

Do you have a question you'd like to ask the manufacturer of this equipment or can you provide feedback regarding your use of this equipment?

Leave your feedback
Other Equipment by this Supplier
Other Equipment