Flexible, Configurable Film and Coating System for Thermal, Magnetron and Ion-Beam Deposition – Caroline D12A1 from ESTO-Vacuum

Caroline D12A1 system, available from ESTO, has been developed for magnetron, thermal and ion-beam deposition on flat substrates such as ceramic, silicon or glass-ceramic substrates with a diameter of less than 100mm and thickness of less than 30mm.

The Caroline D12A1 system can be configured for a wide range of applications by placing different types of equipment to five D12A1 installation points. The system comprises ion sources for initial surface cleaning and etching, magnetrons, ion-beam sputter and thermal evaporator.

Key Features

The main features of the Caroline D12A1 system are:

  • Preliminary cleaning of DC ion source surface for enhanced adhesion of the sputtered films
  • Preheating of substrates and sustaining the substrates temperature throughout film deposition
  • Gas consumption control and gas flow rate stabilization in each channel
  • Control of metal and resistive films deposition process based on the resistance of the piece of the substrate, deposition time and film thickness
  • Full sputtering automation from loading to unloading of substrates
  • Easy-to-install substrates holders for fast loading and unloading operations
  • Rectangular chamber door allows for easy holders changing
  • Special hydraulic lift mechanism for easy maintenance of chamber equipment

Applications

The applications of the Caroline D12A1 system are:

  • Tantalum nitride films deposition
  • Resistive films deposition
  • Thick metal film deposition
  • Consequent PC and metal layers deposition
  • Tantalum and titanium films deposition and layers of corresponding oxides and nitrides
  • Silicon nitride and silicon dioxide films deposition using pure silicon target
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