Double-Sided Magnetron Deposition System – Caroline D12B2 from ESTO-Vacuum

Caroline D12B2 system available from ESTO is designed for double-sided magnetron deposition on any flat substrates such as silicon, ceramic, etc. with a diameter of less than 150mm and thickness of less than 30mm. Maximum surface processing is 150x350mm.

The D12B2 system is fitted with seven magnetron units, three of which are placed outside the drum in particular doors and four are located within the drum. These magnetron units can sputter any material, including resistive alloys of chromium, copper, aluminum, nickel, etc. Substrate holders are placed on a rotating drum. Sputter deposition is carried out in vertical direction on the inner as well as the outer sides of the substrate.

Key Features

The main features of the Caroline D12B2 system are:

  • Preheating of substrates and sustaining the substrates temperature throughout film deposition
  • Preliminary cleaning of DC ion source surface for improved adhesion of the sputtered films
  • Any magnetron target sputtering on controllable shutter
  • Gas consumption control and gas flow rate stabilization in each channel
  • Control of metal and resistive films deposition process based on the resistance of the piece of the substrate and deposition time
  • Full sputtering automation from loading to unloading of substrates
  • Vertical placement of substrates and targets on the drum
  • Easy-to-install substrates holders for fast loading and unloading operations
  • Rectangular chamber door allows for easy holders changing
  • Special hydraulic lift mechanism for easy maintenance of chamber equipment


The applications of the Caroline D12B2 system are:

  • Tantalum nitride films deposition
  • Resistive films deposition
  • Thick metal film deposition
  • Consequent PC and metal layers deposition
  • Tantalum and titanium films deposition and layers of corresponding oxides and nitrides
  • Silicon nitride and silicon dioxide films deposition using pure silicon target
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