Double-Sided Magnetron Deposition System for Large Samples up to 150x650mm – Caroline D12C from ESTO-Vacuum

ESTO’s Caroline D12C system is specifically designed for double-sided magnetron deposition on silicon, ceramic or any flat substrates with a thickness of less than 30mm and diameter of less than 150mm. Maximum surface processing is 150x650mm.

Up to four magnetron units are located within the drum, and sputter deposition is carried out in vertical direction. The system’s magnetron units can sputter any kind of material, including resistive alloys of chromium, copper, aluminum, nickel, etc.

Key Features The main features of the Caroline D12C system are:

  • Preheating of substrates and sustaining the substrates temperature throughout film deposition
  • Preliminary cleaning of DC ion source surface for improved adhesion of the sputtered films
  • Any magnetron target sputtering on controllable shutter
  • Gas consumption control and gas flow rate stabilization in each channel
  • Control of metal and resistive films deposition process based on the resistance of the piece of the substrate and deposition time
  • Full sputtering automation from loading to unloading of substrates
  • Easy-to-install substrates holders for fast loading and unloading operations
  • Vertical placement of substrates and targets on the drum
  • Rectangular chamber door allows for easy holders changing
  • Special hydraulic lift mechanism for easy maintenance of chamber equipment


The applications of the Caroline D12C system are:

  • Tantalum nitride films deposition
  • Resistive films deposition
  • Thick metal film deposition
  • Consequent PC and metal layers deposition
  • Tantalum and titanium films deposition and layers of corresponding oxides and nitrides
  • Silicon nitride and silicon dioxide films deposition using pure silicon target
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