EVG®720 Nanoimprint Lithography System for Mass Manufacturing of Micro- and Nanoscale Structures

UV Nanoimprint Solution for Nanopatterning:

The EVG® 720 system includes a next-generation UV nanoimprint lithography (UV-NIL) technology to allow large-scale production of micro- and nanoscale structures. The system is designed to print nanostructures down to 40nm over a large area with high throughput and low cost of ownership.

Built on EVG's materials expertise, the EVG720 system is perfect for mass production of bioMEMS devices, such as optics, photonics, microfluidics, light emitting diodes (LED), as well as advanced data storage devices.

Key Features

The main features of the EVG® 720 system are:

  • High throughput
  • Inert gas printing
  • Integrated stamp manufacturing prevents the need for stand-alone stamp replication systems
  • Integrated electrostatic discharge reduces particle contamination
  • Increased production speeds
  • Lower photo initiator levels
  • Better chemical resistance and adhesion
  • Faster more consistent curing
  • Low cost of ownership
  • Reduced energy consumption
  • Optical clearance prevents visible vacuum lines in the active imprint area
  • Large area imprint (up to 150 mm square)
  • Top and/or bottom side alignment
  • Maintenance friendly operation with no extra tubing and plumbing
  • Integrated separation of substrate and stamp
  • Open material platform for all commercially available imprint materials.
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