The Nanosys500 system offers true UHV integrity combined with features critical to enable the user to explore full potential of nanoparticle deposition. The main chamber includes a spherical construction with all port axes passing through the centre-point. The chamber has internal welds and is polished for minimizing out-gassing.
Numerous ports are offered for deposition components, with emphasis on below-horizontal alignment to accommodate instruments that use crucibles to contain an evaporant, such as effusion cells. The chamber can be optionally equipped with removable cross-contamination shielding in applications where high rates of deposition are required.
The system makes use of turbodrag pumps with dry backing pumps as standard, enabling pressures in the low 10-9 or 10-10Torr to be achieved (after bakeout).
The key features of the Nanosys Series are:
In the basic system, sample entry can be made through a quick-load hinged door (o-ring sealed). For true UHV applications it is necessary to use a sample entry load-lock.
The sample table/manipulator can fit 2" or multiple smaller samples and can be modified for a number of custom configurations.
Nanosys500 is usually fitted with a nanoparticle source NanoGen50 to allow controlled nanoparticle deposition onto the sample.
E-beam evaporators are installed for thin film deposition of refractory metals or high-temperature ceramics.
RF ion sources can be incorporated into the system for etching or assisted deposition
Mantis Deposition manufactures RF plasma sources which are used to generate beams of higly reactive atomic oxygen or nitrogen.