Large Chamber Sputtering System for Specimen Coating up to 200mm – Q300TT from Quorum Technologies

The Q300TT is a turbomolecular-pumped, large chamber coating system is suited ideally for sputtering a single large diameter specimen up to 8"/200mm such as a wafer or multiple smaller specimens over a similar diameter.

The Q300TT has three individual sputtering heads to ensure even deposition on a range of specimen types. The system is developed to sputter both oxidizing metals such as chromium (Cr) and aluminum (Al), and non-oxidizing (noble) metals, such as gold (Au), gold/palladium (Au/Pd) and platinum (Pt).

The Q300TT has three individual sputtering heads to ensure even sputtering deposition over a large diameter. Chromium (Cr) targets are fitted as standard.

Key Features

The key features of the Q300TT are:

  • Triple sputtering head ensures even coating deposition of large specimens
  • Single target selection for economic coating of small specimens
  • Fine grain sputtering for advanced high resolution FE-SEM applications
  • Coat logging records details of the last 100 coatings available on screen
  • High-vacuum turbo pumping enables sputtering of a wide range of oxidising and non-oxidising (noble) metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications.
  • Thick film coating - up to 60 minutes sputtering time without breaking vacuum
  • Ergonomic one-piece molded case - easy maintenance and service access
  • Ethernet with local FTP server connection - simple programmer updates
  • Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs
  • Precise thickness control using the film thickness monitor option
  • Fully automatic touch screen control - rapid data input, simple operation
  • Multiple, customer-defined coating schedules can be stored - ideal for multi-user laboratories
  • Automatic vacuum control - can be pre-programmed to suit the process and material; no needle valve to adjust
  • Easy-to-change, drop-in style specimen stages (rotation stage as standard)
  • Vacuum shut-down option - leaves the process chamber under vacuum when not in use - improved vacuum performance
  • Pump hold - allows the system to be held in continuous pumping mode, awaiting user input before continuing the process
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