Nanolithography News RSS Feed - Nanolithography

KLA-Tencor Introduces EUV-compatible Teron SL650 Reticle Inspection System for IC Fabs

KLA-Tencor Introduces EUV-compatible Teron SL650 Reticle Inspection System for IC Fabs

Today, KLA-Tencor Corporation announced the Teron™ SL650, a new reticle quality control solution for IC fabs that supports 20nm design nodes and beyond. [More]
Noel Technologies Now Offers Services for Nanoimprint Technology

Noel Technologies Now Offers Services for Nanoimprint Technology

Noel Technologies, a Silicon Valley specialty foundry offering process development and substrate fabrication, is now offering services for nanoimprint technology that reduce the costs of the nanoimprint stamps. [More]
nPoint Inc. Announce Release of Two New Piezo Stages

nPoint Inc. Announce Release of Two New Piezo Stages

With a position noise of 0.4nm in X and Y axis and 0.2nm in the Z, both stages provide the accuracy necessary for today’s advanced applications. When paired with the LC.400 series DSP controllers, the system provides closed-loop capability via capacitive sensors. [More]
Researchers Combine Silk Proteins with Photolithography

Researchers Combine Silk Proteins with Photolithography

When most people think of silk, the idea of a shimmering, silk scarf, or luxurious gown comes to mind. [More]
Global Semiconductor Dry Etching Equipment to Grow at 2.27% CAGR from 2013 to 2018

Global Semiconductor Dry Etching Equipment to Grow at 2.27% CAGR from 2013 to 2018

Research and Markets have announced the addition of the "Global Semiconductor Dry Etching Market 2014-2018" report to their offering. [More]
Research and Markets Adds Report on Global Atomic Layer Deposition Market 2014 - 2018

Research and Markets Adds Report on Global Atomic Layer Deposition Market 2014 - 2018

Research and Markets has announced the addition of the "Global Atomic Layer Deposition Market 2014-2018" report to their offering. [More]
New Mask Aligner MA200 Gen3 Tool for High Volume Manufacturing Launched by SÜSS MicroTec

New Mask Aligner MA200 Gen3 Tool for High Volume Manufacturing Launched by SÜSS MicroTec

SUSS MicroTec, a global supplier of equipment and process solutions for the semiconductor industry and related markets, has launched the new Mask Aligner MA200 Gen3 today. The tool is designed for high volume manufacturing and can be used for exposing wafers with a diameter of up to 200 mm. [More]
OAI Unveils New Non-Contact Lithography System PhableR 100

OAI Unveils New Non-Contact Lithography System PhableR 100

OAI, designers and manufacturers of precision, cost-effective equipment for the Semiconductor MEMS, PV solar energy, nanotechnology and microfluidics today introduced the new non-contact lithography system PhableR 100. [More]
Demand Drives R&D in Micro-Opto-Electro-Mechanical Systems

Demand Drives R&D in Micro-Opto-Electro-Mechanical Systems

Commercial demand is driving high-tech research and development in micro-opto-electro-mechanical systems (MOEMS) for diverse applications such as space exploration, wireless systems, and healthcare. A new special section on Emerging MOEMS Technology and Applications in the current issue of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) gathers recent breakthrough achievements and explains how such innovations in the photonics field are poised to emerge in the marketplace. The journal is published by SPIE, the international society for optics and photonics. [More]
Marvell Introduces 88X3240P Ethernet Transceiver Manufactured Using 28nm Lithography

Marvell Introduces 88X3240P Ethernet Transceiver Manufactured Using 28nm Lithography

Marvell today announced the Marvell® Alaska® X 88X3240P quad-port Ethernet PHY, designed to bring the benefits of IEEE 10GBASE-T standard to a host of equipment types, ranging from data center and enterprise switches to storage and server equipment. [More]