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Canon Announces Development of Next-Generation Nanoimprint Semiconductor Production System

Canon Announces Development of Next-Generation Nanoimprint Semiconductor Production System

Canon U.S.A. Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., is developing a next-generation semiconductor lithography system employing nanoimprint technology that makes possible sub-20 nm1 high-resolution processes. [More]
Asian Customer Places Order for Two Mycronic FPS Mask Writers

Asian Customer Places Order for Two Mycronic FPS Mask Writers

Mycronic AB (publ), has received order for two FPS mask writers from an existing customer in Asia. Delivery is scheduled during the second half of 2016 at the latest. [More]
The University of Manchester Uses Oxford Instruments Tools for Ground Breaking Graphene Research

The University of Manchester Uses Oxford Instruments Tools for Ground Breaking Graphene Research

Ground breaking research into graphene and other 2D materials will take place at The University of Manchester’s new National Graphene Institute using multiple, recently purchased, plasma etch and deposition systems from Oxford Instruments. [More]
Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Toshiba and SK hynix Enter Agreement to Jointly Develop Nano Imprint Lithography

Toshiba today announced that it has entered into a definitive agreement with SK hynix on joint development of Nano Imprint Lithography (NIL). Engineers from the two companies will start development of basic technologies for the process at Toshiba’s Yokohama Complex in Yokohama, Japan in April this year, targeting practical use in 2017. Today’s announcement builds on an MOU that the companies signed in December last year. [More]
Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Leading OSAT Facility Acquires Rudolph JetStep® Advanced Packaging Lithography System

Rudolph Technologies, Inc. announced today that it has shipped the JetStep® Advanced Packaging Lithography System to a leading outsourced assembly and test (OSAT) facility. This new customer will use the JetStep W Series for fan-out wafer level packaging (FO-WLP) applications. [More]
Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

Bristol Awarded £450,000 to Develop GaN Nano-Engineered Semiconductors

The Universities of Bath, Bristol, Sheffield and Strathclyde and their industrial partners have been given funding to develop the UK into a future hub for the manufacture of advanced semiconductor materials. [More]
Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Atomic Force Microscopy Etches Nanoscale Patterns on Conductive Polymers

Researchers at Oak Ridge National Laboratory (ORNL) have successfully carved out nanoscale designs on polymer surfaces using atomic force microscopy (AFM). [More]
Nanolithography Technique Uses Nanoscale Spheres to Create 3D Nanostructures

Nanolithography Technique Uses Nanoscale Spheres to Create 3D Nanostructures

A new nanolithography technique that uses nanoscale polystyrene spheres to create 3D nanostructures for biomedical, photonic and electronic applications has been developed by researchers at the North Carolina State University (NC State). [More]
EV Group Dedicates NILPhotonics Competence Center for Nanoimprint Lithography Solutions

EV Group Dedicates NILPhotonics Competence Center for Nanoimprint Lithography Solutions

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that it has established the NILPhotonics™ Competence Center, which is designed to assist customers in leveraging EVG's suite of nanoimprint lithography (NIL) solutions to enable new and enhanced products and applications in the field of photonics. [More]
A*STAR’s Flexure-Based Electromagnetic Linear Actuator Wins Prestigious R&D Award

A*STAR’s Flexure-Based Electromagnetic Linear Actuator Wins Prestigious R&D Award

A Flexure-Based Electromagnetic Linear Actuator (FELA) developed by the Singapore Institute of Manufacturing Technology (SIMTech), a research institute of the Agency for Science, Technology and Research (A*STAR), is the only locally-developed innovation featured in the 2014 R&D 100 Awards, an international competition that recognises the 100 most technologically-significant products introduced into the marketplace over the past year. [More]
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