Nanolithography News

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New Versatile Method Helps Build Single Nanowire Extending from Specific Starting Point

A versatile method to pattern the structure of nanowires has been developed by a team of Hokkaido University researchers. This new method provides a tool that will aid the development of novel nanodevices.

13 Sep 2016

Researchers Successfully Squeeze More onto Limited Wafer Space of Computer Chip

Manufacturers of computer chips constantly aim to pack more transistors into less space, however with the size of those transistors nearing the atomic scale, there are physical limitations on how small they are able to make the circuitry’s patterns.

8 Sep 2016

Melbourne Centre for Nanofabrication Adds Cutting Edge Nanolithography Capability

Nanotechnology is widely considered to be the way of the future for electronics, medicine and many other scientific endeavours.

1 Aug 2016

SUSS MicroTec Launches New Generation of Semi-Automated Mask and Bond Aligners

SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor industry and related markets, announced the launch of the MA/BA Gen4 series today.

1 Jul 2016

George Washington University Selects Raith Electron Beam Lithography and Large Area SEM Imaging Solutions to Take Their Research to the Next Level

The George Washington University (GW) recently received multiple instruments from the Raith product portfolio to serve its interdisciplinary nanoscale research community at the new Science & Engineering Hall, and important results have already been achieved.

From Raith 18 Apr 2016

Installation of PhableR 100 Nano-Lithography System Helps Boost Semiconductor Research at University of Bath

An innovative nano-lithography printing system has been installed at the University of Bath, making it the only institution in the United Kingdom that has this novel nano-scale patterning equipment. This capability enables the university to play a pioneering role in the advancement of next-generation manufacturing methods for nano-engineered semiconductors.

24 Mar 2016

EVG, JOANNEUM RESEARCH Team Up to Develop Nanoimprint Lithography System for Photonics & Microfluidic Device Production

EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, and JOANNEUM RESEARCH (JR), a leading international research organization based in Graz, Austria, today announced that they are collaborating on a joint-solution for research and development activities in large-area nanoimprinting leveraging the EVG®770 automated UV-nanoimprint lithography (NIL) step-and-repeat system.

11 Mar 2016

Next-Generation EUV Photomask from Toppan Printing for Advanced Semiconductors

Toppan Printing Co., Ltd. (hereafter Toppan Printing; head office: Chiyoda Ward, Tokyo; President & Representative Director: Shingo Kaneko) has developed a next-generation EUV photomask for leading-edge semiconductors.

25 Feb 2016

Oxford Instruments Announce more Speakers for their 2D Materials Processing Technology Workshop

The 2D materials workshop, on Thursday April 7th 2016, is going to take place at the National Graphene Institute (NGI) of Manchester University.

From Oxford Instruments Plasma Technology 24 Feb 2016

New Way to Focus Light Beyond Normal Wavelengths to Reach Nanoscales in Length

Researchers at the Technion-Israel Institute of Technology have developed technology to compress light wavelengths fourfold, providing a way to focus light beyond normal wavelengths to reach nanoscales (a nanometer is a billionth of a meter) in length.

22 Feb 2016

Nanolithography News

New Versatile Method Helps Build Single Nanowire Extending from Specific Starting Point

Researchers Successfully Squeeze More onto Limited Wafer Space of Computer Chip

Melbourne Centre for Nanofabrication Adds Cutting Edge Nanolithography Capability

SUSS MicroTec Launches New Generation of Semi-Automated Mask and Bond Aligners

George Washington University Selects Raith Electron Beam Lithography and Large Area SEM Imaging Solutions to Take Their Research to the Next Level

Installation of PhableR 100 Nano-Lithography System Helps Boost Semiconductor Research at University of Bath

EVG, JOANNEUM RESEARCH Team Up to Develop Nanoimprint Lithography System for Photonics & Microfluidic Device Production

Next-Generation EUV Photomask from Toppan Printing for Advanced Semiconductors

Oxford Instruments Announce more Speakers for their 2D Materials Processing Technology Workshop

New Way to Focus Light Beyond Normal Wavelengths to Reach Nanoscales in Length

Scalable Technique Enables Mass Production of TMT Nanosheets

New Approach to Flawless Nanocellular Graphene

Application of Nanoparticles in Cancer Treatment

Elusive 3D Printed Nanoparticles Could Lead to New Shapeshifting Materials

Self-Assembling Protein Micromaterials Deliver Targeted Therapy for Cancer

Applying AI-Driven Solutions to Semiconductor Digital Design

Redux AFM: Expanding Access to Automated Nanoscale Imaging

Project Pursues Ultra Low-Cost, Flexible Perovskite Solar Cells

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