Arc Plasma Deposition System from ULVAC - MRS 2012

In this video Evan Sohm, Marketing Manager of ULVAC describes about the newly developed coaxial vacuum arc deposition system, APD-S. This system can form extremely smooth ultra thin films or well size-controlled nano-particles, owing to metal plasma of target material generated by pulsed vacuum arc discharge.

It is capable of supporting nanoparticles (particle diameter around 1 nm to 30 nm) effective for controlling cohesion and sintering even in a high temperature environment.

Run Time – 2:51min

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