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ASM International N.V. (NASDAQ:
ASMI and Euronext Amsterdam: ASM), today announced that it has sold its
Pulsar® Atomic Layer Deposition (ALD) system for high-k gates to two top
Japanese logic device manufacturers for insertion in the 32/28nm technology
node. The tools will be used for hafnium-based high-k gate dielectrics, as well
as for the dielectric capping layers used to tune work function of the gate
stack. One customer also ordered ASM's EmerALD® process module for metal
gates.
"These orders further extend our leadership position in delivering manufacturing
solutions for high-k gates, having now shipped well over 100 Pulsar ALD tools,"
said Bob Hollands, Director of Marketing for Transistor Products at ASM. "The
performance benefits of high-k films deposited in the Pulsar, and our customer-focused
approach that enables process integration solutions, were key factors in gaining
these new customers. With process integration knowledge for high-k gates growing,
we are seeing the adoption of high-k metal gates now accelerate rapidly. The
combination of Pulsar and EmerALD demonstrates the benefit of ASM's capability
to deposit in a clustered system the high-k film, the dielectric capping layer
and the metal electrode."
ASM International N.V., headquartered in Almere, the Netherlands, and its
subsidiaries design and manufacture equipment and materials used to produce
semiconductor devices. ASM International and its subsidiaries provide production
solutions for wafer processing (Front-end segment) as well as assembly and packaging
(Back-end segment) through facilities in the United States, Europe, Japan and
Asia. ASM International's common stock trades on NASDAQ (symbol ASMI) and the
Euronext Amsterdam Stock Exchange (symbol ASM).
Posted July 29th, 2009
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