SEMATECH, a global
consortium of chipmakers, and Tokyo Ohka Kogyo Co., Ltd. (TOK), a leading manufacturer
of photoresists, announced today that TOK has joined SEMATECH's Resist Materials
and Development Center (RMDC) at the College of Nanoscale Science and Engineering
(CNSE) of the University at Albany.
The RMDC’s mission is to develop resist and materials for 22 nm patterning
technologies and beyond, and consists of both extreme ultraviolet (EUV) exposure
capability and a portfolio of sponsored university research programs. TOK will
team with researchers at SEMATECH to develop and demonstrate EUV materials and
resists for use at the 22 nm node and beyond.
“We are pleased to welcome TOK as a member, and we are confident this
collaboration will help us build upon the excellent work that SEMATECH’s
lithography researchers have undertaken to drive the development of resist and
materials that are critical for continued progress in manufacturing,”
said John Warlaumont, vice president of advanced technologies at SEMATECH. “This
new partnership is the latest example of SEMATECH’s ongoing effort to
create flexible participation options that will enable broader and deeper partnerships
for advanced materials development.”
“The critical effort to develop and commercialize EUVL technology for
the manufacturing of future nanoelectronics devices will be enhanced by the
addition of Tokyo Ohka Kogyo to SEMATECH’s Resist Materials and Development
Center at CNSE’s Albany NanoTech,” said Richard Brilla, CNSE Vice
President for Strategy, Alliances and Consortia. “This new partnership
will enable additional cutting-edge capabilities at the UAlbany NanoCollege,
building on the global leadership of New York State in nanotechnology education,
research and development, and economic outreach.”
At the RMDC, leading resist and materials suppliers have access to SEMATECH’s
two micro-exposure tools (METs) located at the University at Albany’s
College of Nanoscale Science and Engineering and University of California at
Berkeley, and can participate in focused, cooperative R&D with SEMATECH
member companies. They also have access to the several metrology tools located
in SEMATECH’s RMDC.
“The RMDC brings together the critical capabilities needed to enable
manufacturable EUV,” said Bryan Rice, director of Lithography at SEMATECH.
“Partnering with resist suppliers such as TOK will accelerate EUV resist
development and, in turn, will support timely EUVL introduction.”