Recent advances in producing a variety of new nanoscale products using NanoInk's
patented Dip Pen Nanolithography(R) (DPN(R)) have been achieved with a new thermoelectric
variable temperature stage module. Vice President of NanoInk's NanoFabrication
System Division, Tom Levesque stated "We have seen that the versatility
of the materials which can be controllably deposited with DPN will grow with
this new range of temperatures. Previous work centered around materials deposited
close to ambient conditions, but this new approach enables the deposition of
a wide variety of new molecules that were deemed challenging and impossible
to deposit under ambient conditions. This gives us more flexibility and expands
our choice of chemistries. This new stage extends the range from as low as 4
to as high as 80 degrees C."
Recent work presented at the NSTI meeting in Houston, Texas, showed how extended
temperatures enabled the creation of modified substrates for stem cell culture.
Dr. Nabil A. Amro, Senior Scientist at NanoInk, explained: "Our ability
to fabricate features of alkanethiols under 100nm in size and extending over
areas of square centimeters could not have been achieved without extended temperature
control. These substrates are proving truly remarkable at controlling and selecting
specific stem cell paths of differentiation."
The extended temperature DPN module will be available for NanoInk's DPN 5000
and NSCRIPTOR(R) systems in July. Contact NanoInk for more information at firstname.lastname@example.org.