SUSS MicroTec, a leading
supplier of equipment solutions for 3D Integration, MEMS, Advanced Packaging
and Nanotechnology markets, launches with the MO Exposure Optics a new illumination
system designed for all generations of manual and automatic SUSS mask aligners.
The new optical system is based on unique microlens arrays of high optical quality
to provide higher intensity, improved exposure light uniformity and customized
illumination shaping. This allows users of SUSS MicroTec mask aligners to optimize
the process window and enhance yield in contact and proximity lithography. MO
Exposure Optics (patent pending) has been exclusively developed by SUSS MicroOptics,
a world leading supplier for high-quality optic solutions in illumination, laser
beam shaping, metrology, medical and vision systems.
MO Exposure Optics is provided with a library of illumination settings, including
all established SUSS MicroTec mask aligner settings (A-Optics, D-Optics, LGO
and HR) plus additional settings like ring illumination, dipole, quadrupole,
multipole and maltese cross. By a simple change of the Illumination Filter Plates
(IFP) the user can choose the optimized illumination settings to achieve a higher
process latitude. Automated IFP exchanger will be offered for production mask
aligners. A free choice of optimized illumination settings, e.g. ring illumination
for vias and maltese cross for vertical and horizontal lines will increase the
depth of focus and exposure latitude while reducing mask error factors. The
system also allows users to design fully made-to-order illumination that optimizes
their layer-specific process windows.
"MO Exposure Optics is a major step forward in yield improvements providing
high resolution at even large proximity gaps for all our mask aligners”,
explained Dr. Ralf Süss, general manager of SUSS MicroTec's Lithography
The MO Exposure Optics illumination system is available for immediate shipment
for all manual and automated mask aligners. Existing SUSS MicroTec mask aligners
can be retrofitted in the field.
“By offering the possibility to upgrade the installed base with the new
MO Exposure Optics illumination system we help our customers to protect their
investment in the well-proven mask aligner technology” added Frank P.
Averdung, President and CEO of SUSS MicroTec AG. “It will allow them to
immediately save cost in this challenging economical environment.”