AIXTRON AG, a leading
provider of deposition equipment to the semiconductor industry, announced today
that Nagoya Institute of Technology in Nagoya, Japan, has ordered one Black
Magic II CVD tool.
The order for the tool was received in the first quarter of 2009 and will be
delivered in a 2 inch wafer configuration. It was shipped during Q1 and the
system installation will be completed by the local AIXTRON support team in the
university’s facility during Q2.
The Black Magic II, a combined thermal CVD and plasma enhanced CVD tool, will
be used for the deposition of carbon nanotubes (CNTs) for the development of
technologies for microelectronic devices such as heat sinks, via interconnects
for future LSIs, field-effect transistors (FETs), biological sensors and other
nanotechnology based components.
Associate Prof. Yasuhiko Hayashi, Nagoya Institute of Technology comments:
“In our assessment the AIXTRON Black Magic II CNT system exactly matches
our research aims. The development program for our heat sink, via interconnects,
electronic components and sensor applications requires material growth that
is well controlled vertically as well as being laterally aligned so as to create
CNTs in selectively patterned areas at a high growth rate. I am sure that the
tool will be of great benefit helping us produce useful structures quickly and
efficiently.”
AIXTRON’s Black Magic II CVD (chemical vapor deposition) tool employs
rapid heating and plasma technologies that have been proven in the field since
2005. With this system, customers are able to produce a range of different types
of nanotubes, including low temperature, multiwall, single-wall and super-growth
nanotubes. The tool has been designed to be easy to use for either laboratory
or production facilities