Oxford
Instruments Plasma Technology (OIPT), leading manufacturer of systems for
etch, deposition and growth announces a second order from Liverpool University
for its OpAL Open Load Atomic Layer Deposition tool. OIPT's compact OpAL system
is a unique thermal ALD tool with a clear and easy upgrade route to plasma,
allowing the combination of both plasma and thermal ALD in a single tool. The
first system was purchased as part of an EPSRC funded research project*, and
the second OpAL was purchased as part of a joint industry/government funding
initiative. Liverpool University continues to strengthen its links with industry,
and is achieving this through its collaboration with OIPT and SAFC Hitech.
Oxford Instruments' OpAL ALD System
“Our current OpAL system is being used to develop thermal ALD processes
using ammonia and metal organic precursors for the deposition of hafnium-nitride
and lanthanide nitrides / oxynitrides, these materials are of significant interest
for gate stack applications in integrated circuits. The OpAL system is a solid
research tool, which is well built and has a user friendly control system. As
a research scientist with an interest in developing ALD processes, I especially
like the fact that the OpAL shows plenty of scope for future expansions such
as the plasma upgrade option and access ports for in-situ monitoring,”
comments Dr Richard Potter, University of Liverpool, Dept. of Engineering,
Prof. Paul Chalker, University of Liverpool, Dept. of Engineering adds, “This
additional OpAL system expands our R&D opportunities with plasma. We chose
the OpAL because of its flexibility and its well established suitability for
research applications both here and at other universities running similar projects.”
Chris Hodson, ALD Product Manager at OIPT said, “Oxford Instruments prides
itself in its ongoing commitment to collaborative research, and is involved
with a number of prestigious universities worldwide. Our OpAL systems offer
the most advanced ALD capabilities in a research platform which is ideally suited
to industry collaboration, and we are committed to providing top class equipment
and support to Liverpool University on these projects.”
*EP/E048560/1 - Atomic layer deposition of hafnium-nitride and lanthanide nitrides