A lineup of recognized technical and manufacturing experts from SEMATECH
and International SEMATECH Manufacturing Initiative (ISMI) will offer a series
of lectures and workshop sessions from July 14-16, 2009 at SEMICON West in San
“More than ever, this year’s SEMICON West will be an important
forum for our industry to come together to find the best ways to address complex
technology challenges and to stay productive and profitable in a challenging
business climate,” said Dr. Michael Polcari, SEMATECH’s President
and CEO. “We look forward to meeting with industry colleagues and sharing
data, strategies, and best practices.”
The lineup features five expert speakers representing SEMATECH and its subsidiary
ISMI, who will appear on the Device Scaling TechXPOT Stage in the North Hall
of Moscone Center. Presented by the industry’s most trusted sources in
semiconductor R&D, topics will include CMOS scaling, 3D interconnects, extreme
ultraviolet lithography, and ESH challenges.
The following speakers are scheduled:
- Raj Jammy, SEMATECH’s vice president of Emerging Technologies, “Materials
and Device Challenges for 22 nm and Beyond Technologies, and Manufacturing
Considerations,” July 14 at 10:30 a.m.
- Paul Kirsch, SEMATECH’s director of Front End Processes, “High-k
Dielectric Materials and Electrode Challenges for Advanced Logic and Memory
Technologies at 22 nm and Beyond,” July 14 at 3:00 p.m.
- Sitaram Arkalgud, SEMATECH’s director of 3D Interconnect, “Challenges
in 3D TSV Technology,” July 14 at 3:20 p.m.
- Tom Huang, ISMI’s ESH project manager, “Energy Reduction Challenges
for Semiconductor Fabs and ISMI’s Technology Center Approach,”
July 15 at 12:10 p.m.
- Bryan Rice, SEMATECH’s director of Lithography, “EUV Readiness:
An Infrastructure-Based Perspective,” July 15 at 4:10 p.m.
Additionally, SEMATECH and ISMI will host three public workshops during SEMICON
- Equipment suppliers will share their plans on how new and existing wafer
metrology technologies can be used, modified, or enhanced to measure and improve
3D interconnect processes at SEMATECH's 3D Metrology Workshop on July 16 at
1:00 p.m. in the Yerba Buena Salons (12 and 13), at the Marriott.
- Co-organized with SEMI, ISMI’s e-Manufacturing Workshop and EDA User
Group will focus on the Equipment Data Acquisition interface (Interface A).
e-Manufacturing enabling implementation strategies on the Interface A requirements
will be presented to an audience of chip-makers, equipment companies and software
suppliers on July 16 at 1:00 p.m. in the Golden Gate (A2) Conference Room,
at the Marriott.
- The Energy Conservation Enabler Initiative Workshop, led by SEMI and ISMI,
is the first in a series of global meetings on energy conservation. Participants
will hear formal presentations and engage in working group sessions to identify
and agree on the primary challenges in improving energy use in equipment and
facilities on July 14 at 1:30 p.m. at the Marriott.
Some of SEMATECH’s and ISMI’s most prominent technologists in
the nanoelectronics industry will be attending SEMICON West. Interviews with
executives and technical experts are available upon request. To arrange for
meeting attendance or interviews, please contact firstname.lastname@example.org or