GIA announces the
release of a comprehensive global report on Nanopatterning
market. Though conventional optical lithography techniques are widely used
for fabricating integrated circuit chips with feature sizes up to sub-100nm,
their downside is the very expensive nature of the high-tech lithography systems,
which has restricted their usage to industries having access to ample funds.
New, unconventional nanopatterning techniques attempt to fill this void by offering
low-cost, high-throughout imprinting processes.
Continued research to pattern nanometer scale features using different materials
and resists has ensued the emergence and progress of hot embossing, UV-NIL,
microcontact printing, and dip-pen nanolithography, among others. Still under
research is nanostencil lithography, a high-resolution, shadow mask method with
Among the Nanopatterning technologies, Nanoimprint Lithography (NIL) exhibits
the most promising outlook. With anticipation that NIL emerges successful for
commercial semiconductor manufacturing at 32nm node in the near future, the
market for NIL is projected to grow the fastest between 2008 and 2015. Of the
NIL techniques, UV nanoimprint lithography is projected to grow the fastest
from 2008 to 2015. Another NIL technique expected to perform exceedingly well
is hot embossing lithography.
The second largest nanopatterning market, Scanning Probe Lithography, would
see its share decline from 2008 to 2015. Among the diverse applications, semiconductor
applications and microelectronics fabrication represent the largest nanopatterning
The global marketplace is characterized by participants such as Ambios Technology,
Inc. (USA), AMO GmbH (Germany), EV Group (Austria), Hewlett-Packard Development
Company, L.P. (USA), IMS Chips (USA), International Business Machines Corp.
(USA), Micro Resist Technology GmbH (Germany), Molecular Imprints, Inc. (USA),
NanoInk, Inc. (USA), Nanonex Corp. (USA), NanoOpto Corp. (USA), NIL Technology
(Denmark), Obducat AB (Sweden), Optomec, Inc. (USA), Sigma-Aldrich Corp. (USA),
STMicroelectronics N.V. (Switzerland), SUSS MicroTec AG (Germany), Toppan Photomasks,
Inc. (USA), Transfer Devices, Inc. (USA), Veeco Instruments, Inc. (USA), and
Vistec Semiconductor Systems GmbH (Germany).
"Nanopatterning: A Global Strategic Business Report" announced by
Global Industry Analysts, Inc. provides a comprehensive review of market trends,
technologies, techniques, players, competition, research & development,
recent developments, mergers, acquisitions, and other strategic industry activities.
Global analysis is presented for nanopatterning technologies such as Nanoimprint
Lithography (including hot embossing, UV-NIL, Microcontact Printing and others),
Scanning Probe Lithography, and Other.