Strasbaugh (OTC Bulletin
Board: STRB) announced today that its new STB P300 CMP system will be introduced
at Semicon West in San Francisco, July 14-17, 2009.
The P300 is the semiconductor industry's first CMP system designed to incorporate
Next Generation Factory principles. It combines the greatest production and
process flexibility of any CMP machine on the market with the most advanced
CMP technologies available. With industry-leading process performance, integrated
state-of-the art wafer cleaning, low cost of ownership, and a capital cost of
approximately 50% of the competition, the P300 offers device makers a new and
better choice in CMP.
"The P300 is the first CMP machine in the industry designed to meet the
demand for leaner, more agile, manufacturing," said Chuck Schillings, Strasbaugh
Pres. & CEO. He added, "It provides improved process performance in
a high production system that has the flexibility to support high mix, small
lot applications -- all at a competitive capital cost. The P300 ushers in a
new era in CMP process performance, manufacturability, and price." Strasbaugh's
P300 is available in several configurations to best suit the unique needs of
semiconductor, data storage, SOI, silicon, and MEMS manufacturing.
Several new CMP technologies will be introduced with the P300, including Strasbaugh's
revolutionary new nVision II(TM) optical and motor current endpoint detection
system, its new generation Saturn(TM) wafer carrier, the Precision(TM) pad conditioner,
and industry-proven integrated cleaning.
Poted July 6th, 2009