Surface Technology Systems
plc (STS), a leader in plasma process technologies for manufacturing MEMS
and advanced semiconductor devices, today announced that they have sold a Pegasus
DRIE system to the University of Michigan, Ann-Arbor. This will be installed
alongside another Pegasus tool, purchased in 2008 and will be used for deep
reactive ion etching (DRIE) of silicon for MEMS research.
The University is very highly regarded as one of the leading research institutes
for their microtechnology research and have been using STS’ Advanced Silicon
Etch (ASE®) DRIE technology since 1998.
Dr. Dennis Grimard, Managing Director of the University’s Lurie Nanofabrication
Facility stated, "We have been using STS’ silicon etch equipment
for over 10 years, and this capability has helped us remain at the forefront
of research in micro- and nano- technology. We will use our tools as we continue
to develop and fabricate new and innovative microdevices for a range of challenging
applications, and provide world-class education for the engineers of tomorrow."
Eizo Yasui, CEO of STS replied, “We are very happy to have placed a
second Pegasus tool at an internationally-renowned research facility such as
the University of Michigan, and look forward to continuing our long and mutually
beneficial relationship with them.”