Inc. is pleased to announce that the University of Notre Dame, Notre Dame,
Indiana, has selected Vistec's EBPG5200 system for its cutting-edge nanotechnology
research. The new electron beam lithography system will be used for research
on new electronic, optoelectronic and magnetic device concepts and associated
architectures at Notre Dame's Center for Nano Science and Technology and
the Notre Dame Nanofabrication Facility (NDNF).
The Vistec EBPG5200 represents the next development stage of the successful
EBPG product series. The system is equipped with a modified platform that
supports full exposure of substrates to a maximum size of 200mm. Like the
previous EBPG tools, it can be used to expose fragments and special
substrates, in addition to standard substrate types and sizes. Essential
design principles of the previous EBPG systems have been incorporated into
this new 200mm platform.
With further enhancements in resolution, noise reduction and beam stability,
the Vistec EBPG5200 is set to generate structures to less than 8nm on
substrates of any size and type. Its electron-optical column (TFE source) is
rated for acceleration voltages of 20, 50 and 100kV. With the EBPG5200,
Vistec offers true 100kV / 1mm performance under regular electron-optical
conditions. The maximum deflection rate accounts for 50MHz. The system
incorporates an interactive graphical user interface (GUI) that provides
ease of use for diverse "multi user environments".
"We are continuing to push the performance limits of transistors and other
devices, and we are exploring new physical mechanisms for computation to
overcome the limits of scaling of conventional transistors," said Patrick
Fay, NDNF director. "To address the needs of our research goals, we were
looking for a high-performance nanolithography system. The Vistec system
addresses a number of new application areas and provides high-quality
lithography performance, flexibility and ease of operation. It matched up
best with our research needs."
"The co-operation with leading-edge research institutes such as the
University of Notre Dame is very important for Vistec. Based on our
long-standing business in that market, we take advantage of our customer
base to continuously enhance our products. Our goal is to adapt them to
better serve the diverse and ever-increasing nanotechnology requirements in
research and development", noted Rainer Schmid, General Manager Vistec
Lithography, Inc. "We are very pleased to count University of Notre Dame
among our customers."