Site Sponsors
  • Strem Chemicals - Nanomaterials for R&D
  • Park Systems - Manufacturer of a complete range of AFM solutions
  • Oxford Instruments Nanoanalysis - X-Max Large Area Analytical EDS SDD

Cadence CPF-based Low Power Flow and Integrated DFM Capabilities Enable Simplified Advanced Node Design Methodology for UMC Customers

Published on July 30, 2009 at 8:47 AM

Cadence Design Systems, Inc. (NASDAQ: CDNS), the leader in global design innovation, announced today that it has delivered an end-to-end CPF-based low power and DFM-aware design, verification, and implementation solution tuned for semiconductor foundry UMC in support of its 40-nanometer process technology. The new reference flow provides designers with a reliable, UMC-validated methodology incorporating the latest in low power techniques and model-based DFM analysis and optimization capabilities for maximum power efficiency, superior quality of results, and accelerated yield ramp for advanced node designs.

“The Cadence methodology for UMC’s 40-nanometer process allows designers to create power-efficient chips using a single methodology that delivers consistent power intent all the way to production,” said Stephen Fu, director of the IP Development & Design Support Division at UMC. “In addition, the flow supports the UMC 40-nanometer process with advanced design-side DFM capabilities during physical implementation for lower risk and faster time to volume.”

The UMC reference flow employs the CPF-enabled Encounter® Digital Implementation (EDI) System and Cadence Low-Power Solution, and is aimed at efficient energy use and highest yield for 40-nm system-on-chip designs. The Cadence Low-Power Solution is the industry's first complete flow that integrates logic design, verification, and implementation with the Si2-standard Common Power Format and features power awareness throughout all necessary design steps, including logic synthesis, simulation, design for test, equivalence checking, silicon virtual prototyping, physical implementation and complete signoff analysis. CPF is an Si2-approved industry standard format for specifying power-saving techniques early in the design process, enabling sharing and reuse of low-power intelligence.

In addition to low power, the UMC reference flow also employs the Encounter Digital Implementation System’s full suite of integrated and foundry-certified model-based DFM capabilities for lithography. This enables designers to confidently prevent, analyze, and optimize for potential DFM hot-spots during the physical implementation flow in concert with other optimizations, including timing, signal integrity, area, power, and yield.

“The Cadence Low-Power Solution is unique, and our integrated DFM technologies are essential to advanced design methodologies today,” said Nitin Deo, group marketing director of Implementation Products at Cadence. “We are proud of our collaboration with UMC to provide the industry with a robust 40-nanometer design flow that delivers the most important requirements for designs today: performance, power efficiency, productivity, reliability and superior manufacturability.”

Tell Us What You Think

Do you have a review, update or anything you would like to add to this news story?

Leave your feedback
Submit