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President and CEO of SEMATECH to Outline Challenges and Strategies for the Mask Industry

Published on September 1, 2009 at 8:18 AM

At the upcoming SPIE Photomask Technology Symposium SEMATECH President and CEO Dr. Michael R. Polcari will call for increased industry collaboration to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet) lithography. Polcari will address conference attendees on Tuesday, September 15, 2009 at 8:10 a.m. at the Monterey Marriott and Monterey Conference Center in Monterey, CA.

“Although we recognize that there are multiple technologies to meet the semiconductor industry’s ever-growing lithography demand, we believe EUV can be the cost-effective solution,” said Polcari. “Masks are becoming a major component of lithography costs for advanced semiconductor manufacturing and a mask infrastructure must be available to address the growing demand for high-resolution, low-cost of ownership lithography.”

In his keynote, entitled “Global Collaboration in Semiconductors and Strategies for the Mask Industry,” Polcari will share insights on:

  • the challenges facing the global semiconductor industry and collaborative approaches being taken to address them,
  • how EUV can be the cost-effective lithography solution below 22 nm if issues such as EUV mask defects can be resolved, and
  • how a collaborative strategy to develop new metrology tools will enable EUV and benefit the mask industry.

Dr. Polcari has served as president and CEO of SEMATECH since 2003, directing the global consortium’s advanced technology and manufacturing programs. Previously, Polcari was vice president of Procurement Engineering for IBM Global Procurement. He holds a doctorate in solid state physics from Stevens Institute of Technology, and has served on various industry and university advisory boards.

The 29th Annual SPIE/BACUS Photomask Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year’s symposium will give attendees the chance to hear the latest research on the emerging and on-going issues facing the photomask industry.

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