At the upcoming SPIE Photomask Technology Symposium SEMATECH
President and CEO Dr. Michael R. Polcari will call for increased industry collaboration
to close a critical gap in the mask infrastructure for EUV (extreme ultra-violet)
lithography. Polcari will address conference attendees on Tuesday, September
15, 2009 at 8:10 a.m. at the Monterey Marriott and Monterey Conference Center
in Monterey, CA.
“Although we recognize that there are multiple technologies to meet the
semiconductor industry’s ever-growing lithography demand, we believe EUV
can be the cost-effective solution,” said Polcari. “Masks are becoming
a major component of lithography costs for advanced semiconductor manufacturing
and a mask infrastructure must be available to address the growing demand for
high-resolution, low-cost of ownership lithography.”
In his keynote, entitled “Global Collaboration in Semiconductors and
Strategies for the Mask Industry,” Polcari will share insights on:
- the challenges facing the global semiconductor industry and collaborative
approaches being taken to address them,
- how EUV can be the cost-effective lithography solution below 22 nm if issues
such as EUV mask defects can be resolved, and
- how a collaborative strategy to develop new metrology tools will enable
EUV and benefit the mask industry.
Dr. Polcari has served as president and CEO of SEMATECH since 2003, directing
the global consortium’s advanced technology and manufacturing programs.
Previously, Polcari was vice president of Procurement Engineering for IBM Global
Procurement. He holds a doctorate in solid state physics from Stevens Institute
of Technology, and has served on various industry and university advisory boards.
The 29th Annual SPIE/BACUS Photomask Symposium is the premier worldwide technical
conference and exhibition for the photomask industry. This year’s symposium
will give attendees the chance to hear the latest research on the emerging and
on-going issues facing the photomask industry.