Mentor Graphics Corporation
(NASDAQ:MENT) today announced that it has entered into a multi-year software
and services agreement with GLOBALFOUNDRIES for EDA tools to support advanced
IC development and manufacturing. As part of the agreement, GLOBALFOUNDRIES
has adopted the Mentor Graphics Calibre® platform for the design and verification
of complex semiconductor devices along with computational lithography and mask
data preparation flows, targeting process technologies of 32/28 nanometers and
below. In addition, GLOBALFOUNDRIES will team with the Mentor Graphics Worldwide
Support organization to assist customers using Calibre tools as they develop
new products at advanced process nodes.
“Our focus continues to be on providing the world’s largest semiconductor
design companies with the fastest time-to-volume production in the foundry industry,”
said Mojy Chian, senior vice president of design enablement at GLOBALFOUNDRIES.
“Mentor Graphics technology and services are important additions to the
robust design enablement infrastructure we have built to ensure that our customers
can maximize the benefits of our technology. We chose Mentor Graphics for its
leadership in physical verification and its comprehensive RET, OPC and mask
data preparation solutions. The combination of Mentor’s tools and our
Design for Manufacturing (DFM) capabilities will provide GLOBALFOUNDRIES customers
with the fastest possible time to mask.”
“GLOBALFOUNDRIES’ partnership with Mentor constitutes a unique
and far-reaching collaboration that is bringing leading-edge solutions to the
world’s largest fabless design companies,” said Joseph Sawicki,
vice president and general manager for the Design-to-Silicon division at Mentor
Graphics. “This latest effort builds on the long-standing relationships
between Mentor and GLOBALFOUNDRIES. It will allow GLOBALFOUNDRIES customers
to optimize their designs using solutions that leverage the complete Calibre
offering, including the integration of lithography and CMP process models developed
for Calibre and a comprehensive set of DFM design capabilities on the Calibre
and Olympus-SoC™ tool platforms.”